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Displaying 1926 - 1950 of 2724

Refractometry Using a Helium Standard

April 1, 2005
Author(s)
Jack A. Stone Jr., Alois Stejskal
The refractive index of helium at atmospheric pressure can be calculated from first principles with a very low uncertainty, on the order of 10^-10. Furthermore, the low refractive index of helium puts minimal demands on the pressure and temperature

Scanning Electron Microscope Dimensional Metrology Using a Model-Based Library

April 1, 2005
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are smaller

Thermal decomposition kinetics of RP-1 rocket propellant

March 16, 2005
Author(s)
Peter C. Andersen, Thomas J. Bruno
As part of a thermophysical and transport property measurement project, the global decomposition kinetics of the kerosene based rocket propellant, RP-1, was investigated. We measured the decomposition of RP-1 at elevated temperatures (that is, under

Influence of Focus Variation on Linewidth Measurements

March 3, 2005
Author(s)
M Tanaka, John S. Villarrubia, Andras Vladar
The influence of spatial resolution on line width measurements in the critical dimension scanning electron microscope (CD-SEM) was investigated experimentally. Measurement bias variation and measurement repeatabilities of four edge detection algorithms

2D and 3D Surface Texture Comparisons Using Autocorrelation Functions

January 1, 2005
Author(s)
Jun-Feng Song, Li Ma, Eric P. Whitenton, Theodore V. Vorburger
Autocorrelation and cross-correlation functions are proposed for 2D and 3D surface texture comparisons. At the maximum correlaton point of the two correlated surface textrues, there is a peak shown at the cross-correaltion curve. It is proposed to generate

2D and 3D Surface Texture Comparisons Using Autocorrelation Functions

January 1, 2005
Author(s)
Jun-Feng Song, Li Ma, Eric P. Whitenton, Theodore V. Vorburger
Autocorrelation and cross-correlation functions are proposed for 2D and 3D surface texture comparisons. At the maximum correlation point of the two correlated surface textures, there is a peak shown at the cross-correlation curve. It is proposed to

Internet-Based Surface Metrology Algorithm Testing System

January 1, 2005
Author(s)
Mark C. Malburg, Jayaraman Raja, Son H. Bui, Thomas Brian Renegar, Bui Son Brian, Theodore V. Vorburger
Software is an integral part of most measurement systems and it is particularly important in roughness measurement and analysis. Evaluation and assessment of measured roughness profiles must be performed in accordance with standards. Different types of

Issues in Line Edge and Linewidth Roughness Metrology

January 1, 2005
Author(s)
John S. Villarrubia
In semiconductor electronics applications, line edge and linewidth roughness are generally measured using a root mean square (RMS) metric. The true value of RMS roughness depends upon the length of edge or line that is measured and the chosen sampling

Line Edge Roughness Metrology Using Atomic Force Microscopes

January 1, 2005
Author(s)
Ndubuisi G. Orji, Theodore V. Vorburger, Joseph Fu, Ronald G. Dixson, C Nguyen, Jayaraman Raja
Line edge roughness measurements using two types of atomic force microscopes and two types of tips are compared. Measurements were made on specially prepared samples with inscribed edge roughness of different amplitudes and wavelengths. The spatial

Linewidth Measurement from a Stitched AFM Image

January 1, 2005
Author(s)
Joseph Fu, Ronald G. Dixson, Ndubuisi G. Orji, Theodore V. Vorburger, C Nguyen
Image stitching is a technique that combines two or more images to form one composite image, which provides a field of view that the originals cannot. It has been widely used in photography, medical imaging, and computer vision and graphics. For such

Measurement Uncertainty, CMMs, and Standards: Today and the Future

January 1, 2005
Author(s)
Steven D. Phillips
Over the past decade modern measurement uncertainty evaluation has evolved from an obscure art practiced at National Measurement Institutes (NMIs) to an increasingly intertwined aspect of industrial metrology. This paper examines the progression of

New Capabilities At NIST In Dimensional Metrology

January 1, 2005
Author(s)
Theodore D. Doiron, Eric S. Stanfield, Bryon S. Faust, John R. Stoup, Mary Abbott
A number of new or revised services in dimensional metrology are presented. Included are: a lower cost, high accuracy calibration for sphere diameter; reduced uncertainty in roundness calibration; a new instrument for measurement of the thermal expansion

Photomask Metrology, Photomask Fabrication Technology

January 1, 2005
Author(s)
Richard M. Silver, Andras Vladar
In this paper we will focus on the different metrology techniques used to measure features on photomasks. In view of the above discussion, we will focus on the importance of accurately measuring features and developing traceability. The metrology

Scanning Electron Microscope Dimensional Metrology using a Model-based Library

January 1, 2005
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are smaller

The Influence of Defects on the Morphology of Si (111) Etched in NHF

January 1, 2005
Author(s)
Hui Zhou, Joseph Fu, Richard M. Silver
We have implemented a kinetic Monte-Carlo (KMC) simulation to study the morphologies of Si (111) surfaces etched in NHF. Although our initial simulations reproduced the previous results from Hines, it failed to produce the morphologies observed in our
Displaying 1926 - 1950 of 2724
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