Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

High-resolution Optical Metrology

Published

Author(s)

Richard M. Silver, Ravikiran Attota, Michael T. Stocker, M R. Bishop, Lowell P. Howard, Thomas A. Germer, Egon Marx, M P. Davidson, Robert D. Larrabee

Abstract

Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combine illumination engineering and structured targets which enable sensitivity to nanometer scale changes using optical imaging methods. These methods have been investigated using simulation tools and experimental laboratory apparatus. The simulation results have demonstrated substantial sensitivity to nanometer changes in feature geometry. Similar results have now been observed in the laboratory. In this paper we will show simulation data to motivate the use of low numerical aperture and structured illumination optical configurations. We will also present the basic elements and methods which we are now using in the design of an optical tool specifically designed for these types of measurements. Target configurations which enhance the scattered electromagnetic fields will be shown along with experimental verification of the methodology. The simulation and experimental apparatus is used to explore and optimize target geometry, optical configurations, and illumination structure for applications in both critical dimension and overlay metrology.
Proceedings Title
Proceedings of SPIE
Volume
5752
Conference Dates
March 3, 2005
Conference Location
San Jose, CA
Conference Title
Metrology, Inspection, and Process Control for Microlithography XIX, Richard M. Silver, Editor, May 2005, Contributors to Overlay, Causes Registration Errors

Keywords

ilumination engineering, optical imaging, optical metrology, scatterfield microscopy, target

Citation

Silver, R. , Attota, R. , Stocker, M. , Bishop, M. , Howard, L. , Germer, T. , Marx, E. , Davidson, M. and Larrabee, R. (2005), High-resolution Optical Metrology, Proceedings of SPIE, San Jose, CA (Accessed March 2, 2024)
Created May 1, 2005, Updated February 19, 2017