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Comparison of SEM and HRTEM CD-Measurements Extracted From Monocrystalline Tes-Structures Having Feature Linewidths From 40 nm to 240 nm

Published

Author(s)

W Tan, Robert Allen, Michael W. Cresswell, Christine E. Murabito, B C. Park, Ronald G. Dixson, William F. Guthrie

Abstract

CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to facilitate this type of CD-metrology study. The purpose of the work was to evaluate the calibration statistics of SEM transfer-metrology when HRTEM is used as primary metrology.
Proceedings Title
International Conference on Microelectronic Test Structures
Conference Dates
April 4-7, 2005
Conference Location
Leuven, 1, BE

Keywords

calibration statistics, CD metrology, linewidth, SEM, VLSI

Citation

Tan, W. , Allen, R. , Cresswell, M. , Murabito, C. , Park, B. , Dixson, R. and Guthrie, W. (2005), Comparison of SEM and HRTEM CD-Measurements Extracted From Monocrystalline Tes-Structures Having Feature Linewidths From 40 nm to 240 nm, International Conference on Microelectronic Test Structures, Leuven, 1, BE (Accessed February 23, 2024)
Created April 3, 2005, Updated October 12, 2021