Marx, E.
and Potzick, J.
(2005),
Simulation of Optical Microscope Images for Photomask Feature Size Measurements, 2005 Digest of IEEE Antennas and Propagation Society International Symposium, Unknown, USA (Accessed July 8, 2026)
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Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Published
Author(s)
,
Abstract
Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer. When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of the measurement process because the image does not otherwise yield an accurate value of the dimension being measured. The integral equation form of Maxwell's equations is used in the simulation process described here.Volume
3B
Conference Dates
July 3-8, 2005
Conference Location
Unknown, USA
Conference Title
2005 Digest of IEEE Antennas and Propagation Society International Symposium
Pub Type
Conferences
Keywords
linewidth metrology, Maxwell', s equations, optical image modeling, photomasks
Citation
Issues
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Created July 3, 2005, Updated June 2, 2021