Marx, E.
and Potzick, J.
(2005),
Simulation of Optical Microscope Images for Photomask Feature Size Measurements, 2005 Digest of IEEE Antennas and Propagation Society International Symposium, Unknown, USA
(Accessed October 15, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Published
Author(s)
,
Abstract
Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer. When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of the measurement process because the image does not otherwise yield an accurate value of the dimension being measured. The integral equation form of Maxwell's equations is used in the simulation process described here.Volume
3B
Conference Dates
July 3-8, 2005
Conference Location
Unknown, USA
Conference Title
2005 Digest of IEEE Antennas and Propagation Society International Symposium
Pub Type
Conferences
Keywords
linewidth metrology, Maxwell', s equations, optical image modeling, photomasks
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created July 3, 2005, Updated June 2, 2021