Potzick, J.
(2005),
Photomask Feature Metrology, CRC Press, New York, NY (Accessed April 26, 2026)
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Photomask Feature Metrology
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Abstract
This chapter discusses some general issues with regard to measurement of the size and placement of the features on a photomask.<br>Since all linewidth and placement measurements derive from the location of a feature's edges, the Chapter starts with a discussion of the geometric definition of a line's edge and its position. Then the econometric rationale for feature metrology and measurement uncertainty evaluation is presented, followed by practical definitions for the terms relevant to uncertainty calculations. Then some notes on parametric errors and the correlated errors often found in comparing measurements at different sites, followed by the Neolithography model of integrating metrology and modeling into photomask design and wafer exposure process optimization, and finally some general notes on the relation between the mask metrology process, the wafer manufacturing process, and real mask features.Citation
Chapter 21 of Handbook of Photomask Manufacturing Technology
Publisher Info
CRC Press, New York, NY
Pub Type
Books
Keywords
accuracy, cost of ownership, cost/benefit, linewidth, measurement traceability, measurement uncertainty, metrology
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Issues
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Created April 7, 2005, Updated February 19, 2017