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Search Publications

NIST Authors in Bold

Displaying 1751 - 1775 of 2168

Accurate Dimensional Metrology With Atomic Force Microscopy

June 1, 2000
Author(s)
Ronald G. Dixson, R Koning, Joseph Fu, Theodore V. Vorburger, Thomas B. Renegar
Atomic force microscopes (AFMs) generate three dimensional images with nanometer level resolution and, consequently, are used in the semiconductor industry as tools for sub-micrometer dimensional metrology. Measurements commonly performed with AFMs are

Analysis of Module Interaction in an OMAC Controller

June 1, 2000
Author(s)
John L. Michaloski
Machine controllers built from standardized software parts, commonly referred to as components or modules, have the greatest potential to reap open architecture benefits - including plug-and-play, reusability and extensibility. Modularity is the key to

Is a Production Level Scanning Electron Microscope Linewidth Standard Possible?

June 1, 2000
Author(s)
Michael T. Postek, Andras Vladar, John S. Villarrubia
Metrology will remain a pricipal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 nm and 100 nm linewidths and high aspect ratio structures, the scanning electron microscope (SEM) remains

Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?

June 1, 2000
Author(s)
Michael T. Postek, Andras Vladar, John S. Villarrubia
Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 and l00-nanometer linewidths and high aspect ratio structures, the scanning electron microscope (SEM)

Linewidth Measurement Intercomparison on a BESOI Sample

June 1, 2000
Author(s)
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek, Richard A. Allen, Michael W. Cresswell, Rathindra Ghoshtagore
The effect of the instrument on the measurement must be known in order to generate an accurate linewidth measurement. Although instrument models exist for a variety of techniques, how does one assess the accuracy of these models? Intercomparisons between

The Neolithography Consortium

June 1, 2000
Author(s)
James E. Potzick
The role of process simulation in microlithography is becoming an increasingly important part of process control as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to wafer is nonlinear. An

Molecular Measuring Machine Design and Measurements

May 1, 2000
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 mm area

SEM Sentinel - SEM Performance Measurement System, Part 1

April 1, 2000
Author(s)
Alice V. Ling, Andras Vladar, Bradley N. Damazo, M A. Donmez, Michael T. Postek
This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum system

An Overview of Nano-Micro-Meso Scale Manufacturing at the NIST

March 13, 2000
Author(s)
E Amatucci, Nicholas Dagalakis, Bradley N. Damazo, Matthew A. Davies, John Evans, Jun-Feng Song, E C. Teague, Theodore V. Vorburger
The future of nano-, micro- and meso-scale manufacturing operations will be strongly influenced by a new breed of assembly and manufacturing tools that will be intelligent, flexible, more precise, include in-process production technologies and make use of

A Frequency Stabilized Laser Array for Use in Displacement Metrology

February 17, 2000
Author(s)
J Pedulla, R Deslattes, John R. Lawall
We have developed a frequency stabilized laser system to supply light to measure atomic-scale displacements of a stage moved in real time. Each laser in the array provides enough power (~1 mW) for four Michelson interferometers whose accuracy requires a

Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)

January 31, 2000
Author(s)
J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T. Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof
The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a unified

A Fast Algorithm for Determining the Gaussian Filter Mean Line in Surface Metrology

January 1, 2000
Author(s)
Y B. Yuan, X F. Qiang, Jun-Feng Song, Theodore V. Vorburger
A fast algorithm for assessing the Gaussian filtered mean line was deduced using the central limit theorem and an approximation method. This algorithm only uses simple computer operations such as addition, subtraction and digit shifting, and avoids

A Novel Artifact for Testing Large Coordinate Measuring Machines

January 1, 2000
Author(s)
Steven D. Phillips, Daniel S. Sawyer, Bruce R. Borchardt, David E. Ward, D E. Beutel
We present a high accuracy artifact useful for the evaluation of large CMMs. This artifact can be physically probed by the CMM in contrast to conventional techniques that use purely optical methods such as laser interferometers. The system can be used over

A Simplified Realization for the Gaussian Filter in Surface Metrology

January 1, 2000
Author(s)
Y B. Yuan, Theodore V. Vorburger, Jun-Feng Song, Thomas B. Renegar
A simplified realization for the Gaussian filter in surface metrology is presented in this paper. The sampling function sinu/u is used for simplifying the Gaussian function. According to the central limit theorem, when n approaches infinity, the function

An Analysis of Existing Ontological Systems for Applications in Manufacturing

January 1, 2000
Author(s)
Craig I. Schlenoff, Peter O. Denno, Robert W. Ivester, Simon Szykman, Don E. Libes
The objective of this work described in this paper is to move closer to the ultimate goal of seamless system integration using the principle behind ontological engineering to unambiguously define domain-specific concepts. Current integration efforts are
Displaying 1751 - 1775 of 2168
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