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Displaying 626 - 650 of 855

MECHANICS OF ADHESION

June 1, 2011
Author(s)
Robert F. Cook
Abstract. A framework of increasing complexity is developed to describe the mechanics of adhesion and its reverse, de-adhesion or separation, during indentation contact cycles. The importance of the indentation probe stiffness in determination of system

Inter-ion Coulomb interactions in a Magneto-Optical Trap Ion Source

May 19, 2011
Author(s)
Jabez J. McClelland, Brenton J. Knuffman, Adam V. Steele
We have investigated the role played by inter-ion Coulomb interactions in a magneto-optical trap ion source (MOTIS). Using a Monte Carlo simulation accounting for all pair-wise ion-ion Coulomb interactions in the source, we have calculated the broadening

Progress on CD-AFM tip width calibration standards

May 10, 2011
Author(s)
Ronald G. Dixson, Boon Ping Ng, Craig D. McGray, Ndubuisi G. Orji, Jon C. Geist
The National Institute of Standards and Technology (NIST) is developing a new generation of standards for calibration of CD-AFM tip width. These standards, known as single crystal critical dimension reference materials (SCCDRM) have features with near

Flexible Memristors Fabricated through Sol-Gel Hydrolysis

May 1, 2011
Author(s)
Joseph L. Tedesco, Nadine Gergel-Hackett, Laurie Stephey, Andrew A. Herzing, Madelaine H. Hernandez, Joseph J. Kopanski, Christina A. Hacker, Curt A. Richter
Memristors were fabricated on flexible polyethylene terephthalate substrates consisting of an oxide film generated through hydrolysis of a spun-on sol-gel. X-ray photoelectron spectroscopy, spectroscopic ellipsometry, transmission electron microscopy, and

Optical illumination optimization for patterned defect inspection

April 20, 2011
Author(s)
Bryan M. Barnes, Richard Quintanilha, Martin Y. Sohn, Hui Zhou, Richard M. Silver
Rapidly decreasing critical dimensions (CD) for semiconductor devices drive the study of improved methods for the detection of defects within patterned areas. As reduced CDs are being achieved through directional patterning, additional constraints and

TSOM Method for Semiconductor Metrology

April 18, 2011
Author(s)
Ravikiran Attota, Ronald G. Dixson, John A. Kramar, James E. Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM and

Quantification and Compensation of Unintentional Analyte Aggregation in Electrospray Sampling

March 30, 2011
Author(s)
Mingdong M. Li, Suvajyoti S. Guha, Rebecca A. Zangmeister, Michael J. Tarlov, Michael R. Zachariah
Electrospray (ES) sources are commonly used to introduce non-volatile materials (e.g. nanoparticles, proteins, etc.) in to the gas phase for characterization by mass spectrometry and ion mobility. Recent studies in our group using electrospray ion mobility

Influence of Periodic Patterning on the Magnetization Response of Micromagnetic Structures

March 29, 2011
Author(s)
SangHyun S. Lim, Thomas M. Wallis, Atif A. Imtiaz, Dazhen Gu, Thomas Cecil, Pavel Kabos, Pavol Krivoski
The magnetization dynamics of a single, patterned, thin-film Permalloy (Ni80Fe20, Py) elements embedded in a coplanar waveguide (CPW) are investigated. The anisotropic magnetoresistance (AMR) effect serves as the detection mechanism in current-modulated

Conduction and Loss Mechanisms in Flexible Oxide-Based Memristors

March 21, 2011
Author(s)
Joseph L. Tedesco, Nadine Gergel-Hackett, Laurie Stephey, Andrew A. Herzing, Madelaine H. Hernandez, Christina A. Hacker, Jan Obrzut, Lee J. Richter, Curt A. Richter
In order to study the conduction and loss mechanisms behind their operation, flexible sol-gel based memristors were fabricated with differing oxide film thicknesses and device sizes. XPS, TEM, EELS, and VASE measurements indicated the oxide was amorphous

Challenges for Physical Characterization of Silver Nanoparticles Under Pristine and Environmentally Relevant Conditions

March 17, 2011
Author(s)
Robert I. MacCuspie, Kim Rogers, Manomita Patra, Zhiyong Suo, Andrew J. Allen, Matthew N. Martin, Vincent A. Hackley
The conditions used to disperse silver nanoparticles (AgNPs) strongly impact their resulting size measurements and agglomeration state, based on the underlying metrology and physical chemistry, respectively. A series of AgNP materials with reported

Quantitative Subsurface Contact Resonance Force Microscopy of Model Polymer Nanocomposites

March 16, 2011
Author(s)
Jason P. Killgore, Jennifer Y. Kelly, Christopher M. Stafford, Michael J. Fasolka, Donna C. Hurley
We present experimental results on the use of quantitative contact resonance force microscopy (CR-FM) for mapping the planar location and depth of 50 nm silica nanoparticles buried beneath polystyrene films 30 nm to 165 nm thick. The presence of shallowly
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