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TSOM Method for Semiconductor Metrology

Published

Author(s)

Ravikiran Attota, Ronald G. Dixson, John A. Kramar, James E. Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack

Abstract

Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM and AFM. TSOM can be used in both reflection and transmission modes and is applicable to a variety of target materials and shapes. Nanometrology applications that have been demonstrated experimentally or through simulations include defect analysis, inspection and process control; critical dimension, photomask, overlay, nanoparticle, thin film, and 3D interconnect metrologies; line-edge roughness measurements, and nanoscale movements of parts in MEMS/NEMS. Industries that could benefit include semiconductor, data storage, photonics, biotechnology, and, nanomanufacturing. TSOM is relatively simple and inexpensive, has high throughput, and provides nanoscale sensitivity for 3D measurements with potentially significant savings and yield improvements in manufacturing.
Proceedings Title
SPIE Advanced Lithography
Volume
7971
Conference Dates
February 28-March 3, 2011
Conference Location
San Jose, CA
Conference Title
Metrology Inspection and Process Control

Keywords

TSOM, through focus, optical microscope, nanometrology, process control, nanomanufacturing, nanoparticles, overlay metrology, critical dimension, defect analysis, dimensional analysis, MEMS, NEMS, photonics

Citation

Attota, R. , Dixson, R. , Kramar, J. , Potzick, J. , Vladar, A. , Bunday, B. , Novak, E. and Rudack, A. (2011), TSOM Method for Semiconductor Metrology, SPIE Advanced Lithography, San Jose, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908177 (Accessed June 22, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created April 18, 2011, Updated February 19, 2017