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Journals

Optics for Extreme Ultraviolet Lithography

Author(s)
Steven E. Grantham, Charles S. Tarrio, Shannon B. Hill, Thomas B. Lucatorto
Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade...

NIST Supply Chain Integration Solutions

Author(s)
Sharon J. Kemmerer
The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results...

Corrosion of Intermetallics

Author(s)
P K. Datta, H L. Du, J S. Burnell-Gray, Richard E. Ricker
In many applications of structural materials - aerospace, automobiles, power generation, etc., increasing demands are being made for materials with temperature...
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