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Conferences

A Robust Evaluation of the Object Management Architecture: A Focused Case Study in Legacy System Migration

January 1, 1996

Author(s)

K Wallnau, Evan K. Wallace

It has It has been difficult to objectively assess the real value or maturity of the Object Management Group's Object Management Architecture (OMA). While...

Toward Accurate Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated AFM

January 1, 1996

Author(s)

Ronald G. Dixson, Theodore V. Vorburger, P Sullivan, V W. Tsai, T Mcwaid

Atomic force microscope (AFM) measurements are being used increasingly for metrological applications such as semiconductor process development and control...

Using a Potentiostat to Model In-Process Electromechanical Dressing

January 1, 1996

Author(s)

Robert S. Polvani, A Fraker, Christopher J. Evans

In-process electrochemical dressing insures true, sharp, stable wheels for efficient ceramic grinding. To better implement electrochemical dressing, we couple...

SEM Image Sharpness Analysis

January 1, 1996

Author(s)

Michael T. Postek, Andras Vladar

The technique described here, utilizing the sharpness concept, is facilitated by the use of the FFT techniques to analyze the electron micrograph to obtain the...

Self-Calibrating Optical Thermometer

January 1, 1996

Author(s)

Allen Rose, J. C. Wyss

Relative Intensity Noise of an InGaAsP Laser Over a 22 GHz Bandwidth at Cryogenic and Room Temperature

January 1, 1996

Author(s)

Gregory E. Obarski, Donald R. Larson, Robert J. Phelan

Lithographic Antennas for Submillimeter and Infrared Frequencies

December 31, 1995

Author(s)

Erich N. Grossman

MEMS in Standard CMOS VLSI Technology

December 31, 1995

Author(s)

Michael Gaitan

Wire Bonding to Multichip Modules and Other Soft Substrates

December 31, 1995

Author(s)

George G. Harman

High-Power, High-Frequency Oscillators Using Distributed Josephson-Junction Arrays

December 31, 1995

Author(s)

P. A. Booi, Samuel Benz

Selected Area Deposition of Multiple Active Films for Conductometric Microsensor Arrays

December 31, 1995

Author(s)

Stephen Semancik, Richard E. Cavicchi, John S. Suehle, Kenneth G. Kreider, P Chaparala

Novel Magnetic Field Characterization Techniques for Compound Semiconductor Materials and Devices

December 31, 1995

Author(s)

Curt A. Richter, David G. Seiler, Joseph G. Pellegrino, W. F. Tseng, W. R. Thurber

2D-Scanning Capacitance Microscopy Measurement of Cross-Sectional VLSI Test Structures

December 31, 1995

Author(s)

G. Neubauer, A. Erickson, C. C. Williams, Joseph Kopanski, M. Rodgers, D. Adderton

Characterization of Two-Dimensional Dopant Profiles: Status and Review

December 31, 1995

Author(s)

Alain C. Diebold, M. Kump, Joseph Kopanski, David G. Seiler

A New Physics-Based Model for Time-Dependent-Dielectric-Breakdown

December 31, 1995

Author(s)

B. Schlund, John S. Suehle, C. Messick, P Chaparala

CMOS Circuit Design for Controlling Temperature in Micromachined Devices

December 31, 1995

Author(s)

C. A. Zincke, Michael Gaitan, Mona E. Zaghloul

Optical Characterization of Materials and Devices for the Semiconductor Industry: Trends and Needs

December 31, 1995

Author(s)

S. Perkowitz, David G. Seiler, W M. Bullis

Double-Modulation and Selective Excitation Photoreflectance for Wafer-Level Characterization of Quantum-Well Laser Structures

December 31, 1995

Author(s)

Deane Chandler-Horowitz, David W. Berning, Joseph G. Pellegrino, John H. Burnett, Paul M. Amirtharaj, D. P. Bour, D. W. Treat

Electrical Characterization of Narrow Gap n-type Bulk HgCdTe Single Crystals by Variable-Magnetic-Field Hall Measurements and Reduced-Conductivity-Tensor Analyses

December 31, 1995

Author(s)

Jin S. Kim, David G. Seiler, R. A. Lancaster, M. B. Reine

Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon

December 31, 1995

Author(s)

Joseph Kopanski, Jay F. Marchiando, J R. Lowney

High-Accuracy Principal-Angle Scanning Spectroscopic Ellipsometry of Semiconductor Interfaces

December 31, 1995

Author(s)

Nhan Van Nguyen, Deane Chandler-Horowitz, Joseph G. Pellegrino, Paul M. Amirtharaj

Micromachined Display Output for a Cellular Neural Network

December 31, 1995

Author(s)

R. Yentis, C. A. Zincke, Mona E. Zaghloul, Michael Gaitan

An Electrical Method for Determining the Thickness of Metal Films and the Cross-Sectional Area of Metal Lines

December 31, 1995

Author(s)

Harry A. Schafft, Santos D. Mayo, Samuel N. Jones, John S. Suehle

Measurement of Patterned Film Linewidth for Interconnect Characterization

December 31, 1995

Author(s)

Loren W. Linholm, Richard A. Allen, Michael W. Cresswell, Rathindra Ghoshtagore, Santos D. Mayo, Harry A. Schafft, John A. Kramar, E C. Teague

TDDB Characterization of Thin SiO₂ Films With Bimodal Failure Populations

December 31, 1995

Author(s)

J. Prendergast, John S. Suehle, P Chaparala, E. Murphy, M. Stephenson

Mesoscopic Conductance Fluctuations in Large Devices

December 31, 1995

Author(s)

Curt A. Richter, David G. Seiler, Joseph G. Pellegrino

Effect of Implant Dose on Formation of Buried Oxide Si Islands in Low-Dose SIMOX

December 31, 1995

Author(s)

S. Bagchi, J. H. Lee, S. J. Krause, Peter Roitman

Business and Manufacturing Motivations for the Development of Analytical Technology and Metrology for Semiconductors

December 31, 1995

Author(s)

Thomas J. Shaffner, Alain C. Diebold, R. C. McDonald, David G. Seiler, W M. Bullis

Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO₂ Films

December 31, 1995

Author(s)

John S. Suehle, P Chaparala

OBIC Analysis of Stressed, Thermally Isolated Polysilicon Resistors

December 31, 1995

Author(s)

E. I. Cole, John S. Suehle, K. A. Peterson, P Chaparala, A. N. Campbell, E. S. Snyder, D T. Pierce

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