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The first NIST-traceable SEM magnification calibration standard designed to meet the particular needs of the micromanufacturing industry has been fabricated and
This paper describes a software design for implementing compensation of errors detected by process-intermittent gauging. This is the function of one control
There is a pressing need in the semiconductor industry to determine the dimensions of lithographically produced features on wafers and masks down to the l0?nm
Most alternative non-CFC refrigerants have a large molecular structure and large heat capacity, which influence the slope of saturated liquid line and result in
This presentation will describe some recent activities in collaborative design as it relates to complex electromechanical assemblies (CEMA''s). In today''s
The Systems Integration for Manufacturing Applications (SIMA) Production Project at the U.S. National Institute of Standards and Technology (NIST) is working on
Brominated fire suppressants are effective and widely used. Due to their destruction of stratospheric ozone, however, the production of these chemical was
Despite intensive research efforts over a number of years, an understanding of scalar mixing in turbulent flows remains elusive. An understanding is required
The ultimate purpose of the photomask in IC manufacture is to define the image to be printed on a silicon wafer. Of the many factors which affect this aerial