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Conferences

2D-Scanning Capacitance Microscopy Measurement of Cross-Sectional VLSI Test Structures

December 31, 1995

Author(s)

G. Neubauer, A. Erickson, C. C. Williams, Joseph Kopanski, M. Rodgers, D. Adderton

Characterization of Two-Dimensional Dopant Profiles: Status and Review

December 31, 1995

Author(s)

Alain C. Diebold, M. Kump, Joseph Kopanski, David G. Seiler

A New Physics-Based Model for Time-Dependent-Dielectric-Breakdown

December 31, 1995

Author(s)

B. Schlund, John S. Suehle, C. Messick, P Chaparala

CMOS Circuit Design for Controlling Temperature in Micromachined Devices

December 31, 1995

Author(s)

C. A. Zincke, Michael Gaitan, Mona E. Zaghloul

Optical Characterization of Materials and Devices for the Semiconductor Industry: Trends and Needs

December 31, 1995

Author(s)

S. Perkowitz, David G. Seiler, W M. Bullis

Double-Modulation and Selective Excitation Photoreflectance for Wafer-Level Characterization of Quantum-Well Laser Structures

December 31, 1995

Author(s)

Deane Chandler-Horowitz, David W. Berning, Joseph G. Pellegrino, John H. Burnett, Paul M. Amirtharaj, D. P. Bour, D. W. Treat

Electrical Characterization of Narrow Gap n-type Bulk HgCdTe Single Crystals by Variable-Magnetic-Field Hall Measurements and Reduced-Conductivity-Tensor Analyses

December 31, 1995

Author(s)

Jin S. Kim, David G. Seiler, R. A. Lancaster, M. B. Reine

Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon

December 31, 1995

Author(s)

Joseph Kopanski, Jay F. Marchiando, J R. Lowney

High-Accuracy Principal-Angle Scanning Spectroscopic Ellipsometry of Semiconductor Interfaces

December 31, 1995

Author(s)

Nhan Van Nguyen, Deane Chandler-Horowitz, Joseph G. Pellegrino, Paul M. Amirtharaj

Micromachined Display Output for a Cellular Neural Network

December 31, 1995

Author(s)

R. Yentis, C. A. Zincke, Mona E. Zaghloul, Michael Gaitan

An Electrical Method for Determining the Thickness of Metal Films and the Cross-Sectional Area of Metal Lines

December 31, 1995

Author(s)

Harry A. Schafft, Santos D. Mayo, Samuel N. Jones, John S. Suehle

Measurement of Patterned Film Linewidth for Interconnect Characterization

December 31, 1995

Author(s)

Loren W. Linholm, Richard A. Allen, Michael W. Cresswell, Rathindra Ghoshtagore, Santos D. Mayo, Harry A. Schafft, John A. Kramar, E C. Teague

TDDB Characterization of Thin SiO₂ Films With Bimodal Failure Populations

December 31, 1995

Author(s)

J. Prendergast, John S. Suehle, P Chaparala, E. Murphy, M. Stephenson

Mesoscopic Conductance Fluctuations in Large Devices

December 31, 1995

Author(s)

Curt A. Richter, David G. Seiler, Joseph G. Pellegrino

Effect of Implant Dose on Formation of Buried Oxide Si Islands in Low-Dose SIMOX

December 31, 1995

Author(s)

S. Bagchi, J. H. Lee, S. J. Krause, Peter Roitman

Business and Manufacturing Motivations for the Development of Analytical Technology and Metrology for Semiconductors

December 31, 1995

Author(s)

Thomas J. Shaffner, Alain C. Diebold, R. C. McDonald, David G. Seiler, W M. Bullis

Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO₂ Films

December 31, 1995

Author(s)

John S. Suehle, P Chaparala

OBIC Analysis of Stressed, Thermally Isolated Polysilicon Resistors

December 31, 1995

Author(s)

E. I. Cole, John S. Suehle, K. A. Peterson, P Chaparala, A. N. Campbell, E. S. Snyder, D T. Pierce

Role-Based Access Control (RBAC): Features and Motivations

December 15, 1995

Author(s)

David F. Ferraiolo, Janet A. Cugini, David R. Kuhn

The central notion of Role-Based Access Control (RBAC) is that users do not have discretionary access to enterprise objects. Instead, access permissions are...

Implementing Role-Based Access Control Using Object Technology

December 1, 1995

Author(s)

John Barkley

With Role Based Access Control (RBAC), each role is associated with a set of operations which a user in that role may perform. The power of RBAC as an access...

Two-Tier Multiline TRL for Calibration of Low-Cost Network Analyzers

December 1, 1995

Author(s)

Jeffrey A. Jargon, Roger Marks

We compare calibrations for use on three-sampler vector network analyzers (VNAs), which do not allow the direct application of some advanced error-correction...

Line-Reflect-Match Calibrations with Nonideal Microstrip Standards

December 1, 1995

Author(s)

Dylan F. Williams, J. B. Schappacher

We apply a previously developed Line-Reflect-Match (LRM) calibration that compensates for the nonideal electrical behavior of the match standard to microstrip...

The ADACS Implementation of the UTAP Architecture

December 1, 1995

Author(s)

Robert Russell, John L. Michaloski, Keith A. Stouffer

The Advanced Deburring and Chamfer System is robotic workcell designed to put precision chamfers on parts made with hard metals. The project was funded by the...

Resonant Inelastic X-Ray Scattering from Molecules and Atoms, ed. by D.L. Ederer, J.H. McGuire

December 1, 1995

Author(s)

Uwe Arp, R Deslattes, K E. Miyano, S H. Southworth, B A. Karlin

Solutions Near the Solvent's Critical Point: A Summary

December 1, 1995

Author(s)

Jan V. Sengers

NIST Laboratory Program on Atomic Spectroscopic Data for Astronomy,

December 1, 1995

Author(s)

William C. Martin, G R. Dalton, Jeffrey R. Fuhr, Daniel E. Kelleher, Alexander Kramida, Peter J. Mohr, Arlene Musgrove, Joseph Reader, Edward B. Saloman, Craig J. Sansonetti, J Sugar, G G. Wiersma, Wolfgang L. Wiese, D Zucker, J Blaise, J-F Wyart, G Eichhorn, C S. Grant

High-Performance Tracking with TRICLOPS

December 1, 1995

Author(s)

Albert J. Wavering, H Schneiderman, J Fiala

Vision, Control, Robotics & Intelligent Systems

ADACS: An Advanced Deburring and Chamfering System

December 1, 1995

Author(s)

Keith A. Stouffer, Robert Russell

This paper describes a numerically controlled finishing system, the Advanced Deburring and Chamfering System (ADACS). ADACS employs a user friendly, Graphical...

Optimizing Time-Domain Network Analysis

December 1, 1995

Author(s)

Donald C. DeGroot, Roger Marks

Stylus Technique for Direct Verification of Rockwell Diamond Indenters

November 23, 1995

Author(s)

Jun-Feng Song, F Rudder, Theodore V. Vorburger, J Smith

Based on a stylus technique, a microform calibration system was developed at NIST for the direct verification of Rockwell diamond indenters. The least-squares...

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