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Conferences

Characterization of Metallic Thin Film Growth by STM

January 1, 1996

Author(s)

Angela Davies, Joseph A. Stroscio, Daniel T. Pierce, John Unguris, Mark D. Stiles, Robert Celotta

Recent Progress in Laser Pumped Rubidium Gas Cell Frequency Standards

January 1, 1996

Author(s)

G Mileti, J Q. Deng, F L. Walls, John P. Lowe, Robert E. Drullinger

An Atomic Beam Velocity Servo for Optically Pumped Cesium Frequency Standards

January 1, 1996

Author(s)

W D. Lee, Jon H. Shirley, D A. Jennings, Steven R. Jefferts, Tom Parker, Robert E. Drullinger

Environmental Effects in Frequency Synthesizers for Passive Frequency Standards

January 1, 1996

Author(s)

J F. Garcia nava, F L. Walls, Jon H. Shirley, W D. Lee, M C. Delgado Aramburo

Experimental Studies on Flicker Noise in Quartz Crystal Resonators as a Function of Electrode Volume, Drive Current, Type of Quartz and Fabrication Process

January 1, 1996

Author(s)

Eva Ferre-Pikal, F L. Walls, J R. Vig, J F. Garcia-nava

Design Criteria for BJT Amplifiers with Low 1/f AM and PM Noise,

January 1, 1996

Author(s)

Eva Ferre-Pikal, F L. Walls, Craig Nelson

Relationship of Amplitude and Resonant Frequency in Quartz Crystal Resonance

January 1, 1996

Author(s)

Eva Ferre-Pikal, F L. Walls, J F. Garcia nava

Phase Noise Limitation Due to Amplitude Frequency Effects in State-of-the-Art Quartz

January 1, 1996

Author(s)

R J. Besson, J J. Boy, M Mourey, Eva Ferre-Pikal, F L. Walls

Earth Station Errors in Two-Way Time Transfer

January 1, 1996

Author(s)

F G. Ascarrunz, Steven R. Jefferts, Tom Parker

A Standard for PM and AM Noise at 10.6, 21.2 and 42.4 GHz

January 1, 1996

Author(s)

F G. Ascarrunz, F L. Walls

Environmental Effects on Errors in Two-Way Time Transfer

January 1, 1996

Author(s)

F G. Ascarrunz, Steven R. Jefferts, Tom Parker

TOM: A Target Optical Monitor of Polarization and Luminosity for Polarized Internal Gas Targets, ed. by H. Paetz Gen. Schieck and L. Sydow

January 1, 1996

Author(s)

M L. Pitt, K Ackerstaff, R W. Carr, G R. Court, D Deschepper, A Dvoredsky, Thomas R. Gentile, A Golendoukhin, J F. Kelsey, W Korsch, L H. Kramer, Y Li, R D. Mckeown, R G. Milner, M Niczyporuk, S F. Pate, T Shin, J Sowinski, E Steffens, J Stewart, F Stock, T Wise, K Zapfe-duren

Novel Radiochromic Films for Clinical Dosimetry

January 1, 1996

Author(s)

W L. Mclaughlin, James M. Puhl, M Al-sheikhly, C A. Christou, A Miller, A Kov{aacute}cs, L Wojn{aacute}rovits, D F. And lewis

Hot Particle Intercomparison Dosimetry

January 1, 1996

Author(s)

D G. Kaurin, J W. Baum, M W. Charles, D P. Darley, J S. Durham, M J. Scannell, Christopher G. Soares

The Russian-American Gallium Experiment Cr-Neutrino Source Measurement, ed. by M. Baldo-Ceolin

January 1, 1996

Author(s)

J N. Abdurashitov, Jeffrey S. Nico

Recent Results from SAGE, ed. by M. Baldo-Ceolin

January 1, 1996

Author(s)

J N. Abdurashitov, Jeffrey S. Nico

Doppler-free RIS of the He 1s2 1s - 1s2s 1S Transition at 120.4 nm,

January 1, 1996

Author(s)

S D. Bergeson, A Balakrishnan, K G. Baldwin, Thomas B. Lucatorto

Discovering a System Modernization Decision Framework: A Case Study in Migrating to Distributed Object Technology

January 1, 1996

Author(s)

Evan K. Wallace, P Clements, K Wallnau

Many organizations face a serious challenge introducing new technologies into existing systems. Effective modernization requires knowing and articulating...

A Robust Evaluation of the Object Management Architecture: A Focused Case Study in Legacy System Migration

January 1, 1996

Author(s)

K Wallnau, Evan K. Wallace

It has It has been difficult to objectively assess the real value or maturity of the Object Management Group's Object Management Architecture (OMA). While...

Toward Accurate Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated AFM

January 1, 1996

Author(s)

Ronald G. Dixson, Theodore V. Vorburger, P Sullivan, V W. Tsai, T Mcwaid

Atomic force microscope (AFM) measurements are being used increasingly for metrological applications such as semiconductor process development and control...

Using a Potentiostat to Model In-Process Electromechanical Dressing

January 1, 1996

Author(s)

Robert S. Polvani, A Fraker, Christopher J. Evans

In-process electrochemical dressing insures true, sharp, stable wheels for efficient ceramic grinding. To better implement electrochemical dressing, we couple...

SEM Image Sharpness Analysis

January 1, 1996

Author(s)

Michael T. Postek, Andras Vladar

The technique described here, utilizing the sharpness concept, is facilitated by the use of the FFT techniques to analyze the electron micrograph to obtain the...