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Richard M. Silver, Amy Singer, L Carroll, S Berg-cross, James E. Potzick
Abstract
Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standard reference materials and artifacts. We present the standards development effort at NIST and explain the unique capabilities of the new optical overlay metrology instrument.
Silver, R.
, Singer, A.
, Carroll, L.
, Berg-cross, S.
and Potzick, J.
(1996),
Optical Overlay Metrology at NIST, Proceedings of KLA Microlithography Seminar, Gaithersburg, MD
(Accessed March 28, 2024)