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Optical Overlay Metrology at NIST

Published

Author(s)

Richard M. Silver, Amy Singer, L Carroll, S Berg-cross, James E. Potzick

Abstract

Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standard reference materials and artifacts. We present the standards development effort at NIST and explain the unique capabilities of the new optical overlay metrology instrument.
Proceedings Title
Proceedings of KLA Microlithography Seminar
Conference Dates
January 1, 1996
Conference Location
Gaithersburg, MD

Keywords

optics, overlay metrology, overlay standards, stepped microcone, tool induced shift

Citation

Silver, R. , Singer, A. , Carroll, L. , Berg-cross, S. and Potzick, J. (1996), Optical Overlay Metrology at NIST, Proceedings of KLA Microlithography Seminar, Gaithersburg, MD (Accessed April 13, 2024)
Created January 1, 1996, Updated February 19, 2017