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Conferences

High-Current Thin Film Multijunction Thermal Converters and Multi-Converter Modules

June 1, 1996

Author(s)

Joseph R. Kinard Jr., Thomas E. Lipe Jr., Clifton B. Childers, Donald B. Novotny, D. X. Huang

Uncertainties of Frequency Response Estimates Derived from Responses to Uncertain Step-Like Inputs

June 1, 1996

Author(s)

J. P. Deyst, T. M. Souders, Jerome J. Blair

Exploring the Low Frequency Performance of Thermal Converters Using Circuit Models and a Digitally Synthesized Source

June 1, 1996

Author(s)

Nile M. Oldham, Mark E. Parker, Barry A. Bell, S. Avramov

A New Refractometer by Combining a Variable Length Vacuum Cell and a Double-Pass Michelson Interferometer

June 1, 1996

Author(s)

K Fujii, Edwin R. Williams, Richard L. Steiner

Loading Effects in Resistance Scaling

June 1, 1996

Author(s)

Randolph Elmquist, Ronald F. Dziuba

Proposed Tests to Evaluate the Frequency-Dependent Capacitor Ratio for Single Electron Tunneling Experiment

June 1, 1996

Author(s)

S. Avramov, Neil M. Zimmerman, Alan F. Clark, Anne-Marie Jeffery

Conversion of a 2-Terminal-Pair Bridge to a 4-Terminal-Pair Bridge for Increased Range and Precision in Impedance Measurements

June 1, 1996

Author(s)

Anne-Marie Jeffery, John Q. Shields, Lai H. Lee

The NIST Watt Balance: Progress Toward Monitoring the Kilogram

June 1, 1996

Author(s)

Richard L. Steiner, Andrew Gillespie, K Fujii, Edwin R. Williams, David B. Newell, Alain Picard, Gerard N. Stenbakken, P. T. Olsen

Low Voltage Standards in the 10 Hz to 1 MHz Range

June 1, 1996

Author(s)

Nile M. Oldham, Mark E. Parker, Bryan C. Waltrip, S. Avramov

An Active High Voltage Divider with 20-PPM Uncertainty

June 1, 1996

Author(s)

O. Petersons, Eric D. Simmon, Gerald FitzPatrick

A New Modulation Method for Sensitive Nonlinear Spectroscopy - Application to Molecular Overtones as Visible Frequency References

June 1, 1996

Author(s)

L -. Ma, Jun Ye, P Dub, John L. Hall

Following de Labachelerie, Nadagawa and Ohtsu (Ref. 6), we note the possibility to obtain saturated absoption spectra of a weakly-absorbing gas sample by...

Computerized Representations of Manufacturing Resources: Statement of Need and a Proposed Solution

June 1, 1996

Author(s)

James E. Fowler, Mary B. Algeo, Kevin K. Jurrens

The Systems Integration For Manufacturing Applications (SIMA) Program is NIST's coordinating focus for manufacturing activities supporting the High Performance...

RF-DC Differences of Micropotentiometers

June 1, 1996

Author(s)

D. X. Huang, G. Rebuldela, J. Harper

Validation of Standards Interfaces for Machine Control

May 27, 1996

Author(s)

Frederick M. Proctor, John L. Michaloski, William P. Shackleford, Sandor S. Szabo

Open architecture controllers offer a multitude of benefits to users of machine tools, robots, and coordinate measuring machines, ultimately reducing the life...

Analysis of High Bay Hangar Facilities for Detector Sensitivity and Placement

May 20, 1996

Author(s)

Kathy A. Notarianni, J E. Gott

Existing building and fire codes in the United States offer little or no guidance in the design of fire protection systems in high bay spaces due to the lack of...

Polymer Combustion and New Flame Retardants

May 20, 1996

Author(s)

Takashi Kashiwagi, Anthony P. Hamins, Kenneth D. Steckler, Jeffrey W. Gilman

The combustion of polymers is a complex coupled process characterized by energy feedback from a flame to the polymer surface and subsequent gasification of the...

New Silyl Derivatives for the Determination of Alcohols by GC/MS

May 12, 1996

Author(s)

Vladimir G. Zaikin, Michael Y. Shmatko, Anzor I. Mikaia

1-Methyl-1-silacyclobutyl, 1-Methyl-1-silacyclopentyl, pentamethyldisilaethyl and pentamethyl-1,3- disilapropyl derivatives for alcohols are obtained, and...

Ab Initio Calculations and Kinetic Modeling of Halon and Halon Replacements

May 7, 1996

Author(s)

H. L. Paige, R J. Berry, M Schwartz, P Marshall, D R. Burgess, Marc R. Nyden

The mode of action of the chemical-acting flame suppression agents such as the halons is generally, though not universally, accepted. The details of the several...

Quantum Hall Effect-Based Resistance Standard

May 1, 1996

Author(s)

Kevin C. Lee

Characterization of ultrafast interactions with materials through the direct measurement of the optical phase

May 1, 1996

Author(s)

Tracy S. Clement, G Rodriguez, W M. Wood, A J. Taylor

The change in phase of ultrashot optical pulses induced by traveling through nonlinear media is used to determine the nonlinear index of refraction and to study...

Controlling Activities in a Virtual Manufacturing Cell

May 1, 1996

Author(s)

Michael Iuliano, Albert W. Jones

Researchers at the National Institute of Standards and Technology are developing a virtual manufacturing cell. This cell will contain simulation models of a...

Dynamic Objects and Meta-level Programming of an EXPRESS Language Environment

May 1, 1996

Author(s)

Peter O. Denno

This paper describes design and programming techniques employed in the development of a language environment for the EXPRESS information modeling language. A...

SEMCconductors Resistivity Measurements Using Split-Dielectric Resonator Technique

May 1, 1996

Author(s)

Jerzy Krupka, S. Pietruszko, Richard G. Geyer, James R. Baker-Jarvis, Kristof Derzakowski

Interference-Filter Characterization of Spectraradiometers and Colorimeters

May 1, 1996

Author(s)

Paul A. Boynton, Yoshi Ohno, Edward F. Kelley

Specular and Diffuse Reflection Measurements of Electronic Displays

May 1, 1996

Author(s)

George R. Jones Jr., Edward F. Kelley, Thomas Germer

Measurement of a CD and Sidewall Angle Artifact with Two Dimensional CD AFM Metrology

May 1, 1996

Author(s)

Ronald G. Dixson, N. Sullivan, J Schneir, T Mcwaid, V W. Tsai, J Prochazka, M. Young

Despite the widespread acceptance of SEM metrology in semiconductor manufacturing, there is no SEM CD standard currently available. Producing such a standard is...

SEM Performance Evaluation Using the Sharpness Criterion

May 1, 1996

Author(s)

Michael T. Postek, Andras Vladar

Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The...

International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL)

May 1, 1996

Author(s)

James E. Potzick, J Nunn

Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards...

New Algorithm for the Measurement of Pitch in Metrology Instruments

May 1, 1996

Author(s)

Nien F. Zhang, Michael T. Postek, Robert D. Larrabee, L Carroll, William J. Keery

Traditionally, the measurement of pitch in metrology instruments is thought to be a benign self-compensating function. However, as the measurement uncertainty...

Calibration of Scanning Electron Microscope Magnification Standards SRM-484

May 1, 1996

Author(s)

Joseph Fu, Theodore V. Vorburger, D Ballard

Standard Reference Material (SRM) 484 is an artifact for calibrating the magnification scale of a scanning electron microscope. Since 1977 the National...

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