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Researchers at the National Institute of Standards and Technology are developing a virtual manufacturing cell. This cell will contain simulation models of a...
This paper describes design and programming techniques employed in the development of a language environment for the EXPRESS information modeling language. A...
Ronald G. Dixson, N. Sullivan, J Schneir, T Mcwaid, V W. Tsai, J Prochazka, M. Young
Despite the widespread acceptance of SEM metrology in semiconductor manufacturing, there is no SEM CD standard currently available. Producing such a standard is...
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The...
Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards...
Nien F. Zhang, Michael T. Postek, Robert D. Larrabee, L Carroll, William J. Keery
Traditionally, the measurement of pitch in metrology instruments is thought to be a benign self-compensating function. However, as the measurement uncertainty...
Standard Reference Material (SRM) 484 is an artifact for calibrating the magnification scale of a scanning electron microscope. Since 1977 the National...
Two Monte Carlo computer codes have been written to simulate the transmitted-, backscattered-, and secondary-electron signals from targets in a scanning...
Michael W. Cresswell, J Sniegowski, Rathindra Ghoshtagore, Robert Allen, L Linholm, John S. Villarrubia
Measurements of the linewidths of submicrometer features made by different metrology techniques have frequently been characterized by differences of up to 90 nm...
Richard M. Silver, James E. Potzick, Fredric Scire, Robert D. Larrabee
The reduced critical dimensions of semiconductor devices place more stringent requirements on the precision and accuracy of overlay metrology tools used to...
Ronald G. Dixson, J Schneir, T Mcwaid, N. Sullivan, V W. Tsai, S Zaidi, S Brueck
As the critical dimensions of integrated circuit features decrease toward 0.18 um, feature width measurements with nanometer level accuracy will become...
William D. Davis, Glenn P. Forney, Richard W. Bukowski
The National Institute of Standards and Technology (NIST) is conducting a four-year research project where in a computational fluid dynamics (CFD) computer code...
A computer controlled HMMWV automatically retraces a previously recorded path using navigation data, a process we have termed retrotraverse. A Kalman filter...
This paper describes a technique that allows automation and testing of charactergraphic programs using existing public-domain tools. Specially, Tcl, Tk and...
Kathy A. Notarianni, William D. Davis, Darren Lowe, J E. Gott, S Laramee
This study was conducted to investigate the response of various fire detectors and automatic sprinklers in high bay aircraft hangars. Laboratory and full-scale...
The ban on the production of the fire suppressant CF3Br has created a need for replacement agents. Obvious alternatives are other halogenated hydrocarbons, and...
Thomas G. Cleary, William L. Grosshandler, Marc R. Nyden, William J. Rinkinen
Levels of CO, CO2, H2O, hydrocarbons, smoke, temperature and velocity produced in the plumes of smoldering/pyrolyzing wood and smoldering cotton fires are...
The National Institute of Standards and Technology (NIST) has conducted a study with office work stations to examine their heat release rates and to determine...
Local probability density functions (PDF) of absorption coefficients within turbulent flames have been retrieved from their multi-angular absorption data of...