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Conferences

RF-DC Differences of Micropotentiometers

June 1, 1996

Author(s)

D. X. Huang, G. Rebuldela, J. Harper

Validation of Standards Interfaces for Machine Control

May 27, 1996

Author(s)

Frederick M. Proctor, John L. Michaloski, William P. Shackleford, Sandor S. Szabo

Open architecture controllers offer a multitude of benefits to users of machine tools, robots, and coordinate measuring machines, ultimately reducing the life...

Analysis of High Bay Hangar Facilities for Detector Sensitivity and Placement

May 20, 1996

Author(s)

Kathy A. Notarianni, J E. Gott

Existing building and fire codes in the United States offer little or no guidance in the design of fire protection systems in high bay spaces due to the lack of...

Polymer Combustion and New Flame Retardants

May 20, 1996

Author(s)

Takashi Kashiwagi, Anthony P. Hamins, Kenneth D. Steckler, Jeffrey W. Gilman

The combustion of polymers is a complex coupled process characterized by energy feedback from a flame to the polymer surface and subsequent gasification of the...

New Silyl Derivatives for the Determination of Alcohols by GC/MS

May 12, 1996

Author(s)

Vladimir G. Zaikin, Michael Y. Shmatko, Anzor Mikaia

1-Methyl-1-silacyclobutyl, 1-Methyl-1-silacyclopentyl, pentamethyldisilaethyl and pentamethyl-1,3- disilapropyl derivatives for alcohols are obtained, and...

Ab Initio Calculations and Kinetic Modeling of Halon and Halon Replacements

May 7, 1996

Author(s)

H. L. Paige, R J. Berry, M Schwartz, P Marshall, D R. Burgess, Marc R. Nyden

The mode of action of the chemical-acting flame suppression agents such as the halons is generally, though not universally, accepted. The details of the several...

Quantum Hall Effect-Based Resistance Standard

May 1, 1996

Author(s)

Kevin C. Lee

Characterization of ultrafast interactions with materials through the direct measurement of the optical phase

May 1, 1996

Author(s)

Tracy S. Clement, G Rodriguez, W M. Wood, A J. Taylor

The change in phase of ultrashot optical pulses induced by traveling through nonlinear media is used to determine the nonlinear index of refraction and to study...

Controlling Activities in a Virtual Manufacturing Cell

May 1, 1996

Author(s)

Michael Iuliano, Albert W. Jones

Researchers at the National Institute of Standards and Technology are developing a virtual manufacturing cell. This cell will contain simulation models of a...

Dynamic Objects and Meta-level Programming of an EXPRESS Language Environment

May 1, 1996

Author(s)

Peter O. Denno

This paper describes design and programming techniques employed in the development of a language environment for the EXPRESS information modeling language. A...

SEMCconductors Resistivity Measurements Using Split-Dielectric Resonator Technique

May 1, 1996

Author(s)

Jerzy Krupka, S. Pietruszko, Richard G. Geyer, James R. Baker-Jarvis, Kristof Derzakowski

Interference-Filter Characterization of Spectraradiometers and Colorimeters

May 1, 1996

Author(s)

Paul A. Boynton, Yoshi Ohno, Edward F. Kelley

Specular and Diffuse Reflection Measurements of Electronic Displays

May 1, 1996

Author(s)

George R. Jones Jr., Edward F. Kelley, Thomas Germer

Measurement of a CD and Sidewall Angle Artifact with Two Dimensional CD AFM Metrology

May 1, 1996

Author(s)

Ronald G. Dixson, N. Sullivan, J Schneir, T Mcwaid, V W. Tsai, J Prochazka, M. Young

Despite the widespread acceptance of SEM metrology in semiconductor manufacturing, there is no SEM CD standard currently available. Producing such a standard is...

SEM Performance Evaluation Using the Sharpness Criterion

May 1, 1996

Author(s)

Michael T. Postek, Andras Vladar

Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The...

International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL)

May 1, 1996

Author(s)

James E. Potzick, J Nunn

Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards...

New Algorithm for the Measurement of Pitch in Metrology Instruments

May 1, 1996

Author(s)

Nien F. Zhang, Michael T. Postek, Robert D. Larrabee, L Carroll, William J. Keery

Traditionally, the measurement of pitch in metrology instruments is thought to be a benign self-compensating function. However, as the measurement uncertainty...

Calibration of Scanning Electron Microscope Magnification Standards SRM-484

May 1, 1996

Author(s)

Joseph Fu, Theodore V. Vorburger, D Ballard

Standard Reference Material (SRM) 484 is an artifact for calibrating the magnification scale of a scanning electron microscope. Since 1977 the National...

High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope

May 1, 1996

Author(s)

J R. Lowney, Andras Vladar, Michael T. Postek

Two Monte Carlo computer codes have been written to simulate the transmitted-, backscattered-, and secondary-electron signals from targets in a scanning...

Electrical Test Structures Replicated in Silicon-On-Insulator Material

May 1, 1996

Author(s)

Michael W. Cresswell, J Sniegowski, Rathindra Ghoshtagore, Robert Allen, L Linholm, John S. Villarrubia

Measurements of the linewidths of submicrometer features made by different metrology techniques have frequently been characterized by differences of up to 90 nm...

High Accuracy Overlay Measurements

May 1, 1996

Author(s)

Richard M. Silver, James E. Potzick, Fredric Scire, Robert D. Larrabee

The reduced critical dimensions of semiconductor devices place more stringent requirements on the precision and accuracy of overlay metrology tools used to...

Toward Accurate Linewidth Metrology Using Atomic Force Microscopy and Tip Characterization

May 1, 1996

Author(s)

Ronald G. Dixson, J Schneir, T Mcwaid, N. Sullivan, V W. Tsai, S Zaidi, S Brueck

As the critical dimensions of integrated circuit features decrease toward 0.18 um, feature width measurements with nanometer level accuracy will become...

Fundamentals and Problems of Fiber Current Sensors

May 1, 1996

Author(s)

Gordon W. Day, Kent B. Rochford, Allen Rose

Magneto-Optic Rotation Sensor Using a Laser Diode as Both Source and Detector

May 1, 1996

Author(s)

Kent B. Rochford, Allen Rose

Maintaining multi-level planar maps in intelligent systems

April 26, 1996

Author(s)

John A. Horst

Robotics & Intelligent Systems, Unmanned Systems, Mobility, Control

Developing Detector Siting Rules From Computational Experiments in Spaces With Complex Geometries

April 4, 1996

Author(s)

William D. Davis, Glenn P. Forney, Richard W. Bukowski

The National Institute of Standards and Technology (NIST) is conducting a four-year research project where in a computational fluid dynamics (CFD) computer code...

GPS Aided Retrotraverse For Unmanned Ground Vehicles

April 1, 1996

Author(s)

Karl Murphy, Steven Legowik

A computer controlled HMMWV automatically retraces a previously recorded path using navigation data, a process we have termed retrotraverse. A Kalman filter...

Terminal Emulation for Automation and Testing of Character-Graphic Programs: A Code Walkthrough

April 1, 1996

Author(s)

Don E. Libes

This paper describes a technique that allows automation and testing of charactergraphic programs using existing public-domain tools. Specially, Tcl, Tk and...

Complex Permeability Measurements of Microwave Ferrites

April 1, 1996

Author(s)

Richard G. Geyer, Jerzy Krupka

Phase Measurements of Electromagnetic Fields Using Infrared Imaging Techniques and Microwave Holography

April 1, 1996

Author(s)

J. E. Will, J. Morgard, Carl F. Stubenrauch, Katherine MacReynolds, M. Seifert, R. Sega

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