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Conferences

The Neolithography Consortium

Author(s)
James E. Potzick
The role of process simulation in microlithography is becoming an increasingly important part of process control as wafer feature sizes become smaller than the

Coplanar-Waveguide-to-Microstrip Transition Model

Author(s)
Wojciech Wiatr, Dave K. Walker, Dylan Williams
We develop a novel four-port equivalent circuit for a coplanar-waveguide-to-microstrip transition using a finite-difference time-domain analysis. The lumped

Information Technology for Engineering and Manufacturing

Author(s)
Michael Gruninger, Barbara L. Goldstein, Kevin G. Brady, Simon Szykman, Charles R. McLean, Joshua Lubell
Advances in information technology are frequently cited as the basis for the continued growth of the U.S. economy. Manufacturers use information technology

Superconducting Transition Edge Sensor Bolometer Arrays for Submillimeter Astronomy

Author(s)
D. J. Benford, C. A. Allen, A. S. Kutyrev, S. H. Mosely, Rick A. Shafer, James A. Chervenak, Erich N. Grossman, Kent D. Irwin, John M. Martinis, Carl D. Reintsema
Studies of astrophysical emission in the far-infrared and submillimeter will increasingly require large arrays of detectors containing hundreds to thousands of

Performance Data on Cold Temperature Dispersion of CF3I

Author(s)
Jiann C. Yang, Thomas G. Cleary, Michelle K. Donnelly
Tritluoroiodomethane (CF3I) has been proposed as a potential replacement for Halon 1301 in aircraft engine nacelle and dry bay fire protection applications. The

Molecular Measuring Machine Design and Measurements

Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of
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