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Conferences

Computation of Causal Characteristic Impedances

Author(s)
Dylan F. Williams, Ronald C. Wittmann
We develop a numerical method of determining the magnitude of characteristic impedance required by causal power-normalized circuit theories from its phase using

Modeling of Stable and Unstable Polarization Switching

Author(s)
H Kessler, Lin-Sien H. Lum, H Balke
We examine the stability of polarization switching in polyscrystalline ferroelectric/ferroelastic materials subject to continuous electromechanical loading. In

An XML Repository Architecture for STEP Modules

Author(s)
Joshua Lubell
NIST is developing a web-based repository to serve as the core of a modular environment for developers of STEP, a family of product data exchange standards

The Neolithography Consortium

Author(s)
James E. Potzick
The role of process simulation in microlithography is becoming an increasingly important part of process control as wafer feature sizes become smaller than the

Characterization of Asymmetric Coupled CMOS Lines

Author(s)
Uwe Arz, Dylan F. Williams, Dave K. Walker, J. E. Rogers, M. Rudack, D. Treytner, Hartmut Grabinski
This paper investigates the properties of asymmetric coupled lines built in a 0.25 5m CMOS technology in the frequency range of 50 MHz to 26.5 GHz. We show that

Accurate Dimensional Metrology With Atomic Force Microscopy

Author(s)
Ronald G. Dixson, R Koning, Joseph Fu, Theodore V. Vorburger, Thomas B. Renegar
Atomic force microscopes (AFMs) generate three dimensional images with nanometer level resolution and, consequently, are used in the semiconductor industry as

Linewidth Measurement Intercomparison on a BESOI Sample

Author(s)
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek, Richard A. Allen, Michael W. Cresswell, Rathindra Ghoshtagore
The effect of the instrument on the measurement must be known in order to generate an accurate linewidth measurement. Although instrument models exist for a
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