U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications by: Vivek M. Prabhu (Fed)

Search Title, Abstract, Conference, Citation, Keyword or Author
Displaying 126 - 150 of 223

Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist

February 25, 2007
Author(s)
Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric K. Lin, Wen-Li Wu, John T. Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and

Evaluation of the 3D Compositional Fluctuation Effect on Line-Edge-Roughness

February 25, 2007
Author(s)
Shuhui Kang, Wen-Li Wu, B D. Vogt, Vivek Prabhu, Eric K. Lin, Karen Turnquest
Line-edge-roughness (LER) and the relationship to resist processing and materials design is a critical problem for sub-65 nm photolithography. In this work we investigate how chemical composition fluctuations (heterogeneity) produced by the reaction

FTIR measurements of compositional heterogeneities

February 25, 2007
Author(s)
Shuhui Kang, B D. Vogt, Wen-Li Wu, Vivek Prabhu, David L. VanderHart, Ashwin Rao, Eric K. Lin, Karen Turnquest
A general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy has been demonstrated Polymer films with varying degrees of heterogeneity were prepared using a model chemically

Identifying Materials Limits of Chemically Amplified Photoresists

February 25, 2007
Author(s)
Wen-Li Wu, Vivek Prabhu, Eric K. Lin
Chemically amplified photoresists are likely to remain the primary imaging materials for the semiconductor industry. As feature sizes decrease to dimensions comparable to the characteristic size of the molecules in the photoresist, a significant challenge

Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy

February 9, 2007
Author(s)
Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, David L. VanderHart, Ashwin Rao, Karen Turnquest
We demonstrate a general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy. Polymer films with varying degrees of heterogeneity were prepared using a model chemically amplified

The Effect of Deprotection Extent on Swelling and Dissolution Regimes of Thin Polymer Films

October 28, 2006
Author(s)
Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek M. Prabhu, Eric K. Lin, Wen-Li Wu, M Muthukumar
The response of unentangled polymer thin films to aqueous hydroxide solutions is measured as a function of increasing weakly-acidic methacrylic acid comonomer content produced by an in-situ reaction-diffusion process. Quartz crystal microbalance with
Was this page helpful?