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Search Publications by: Vivek M. Prabhu (Fed)

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Displaying 151 - 175 of 223

Deprotection Kinetics in 193 nm Photoresist Thin Films: Influence of Copolymer Content

July 25, 2006
Author(s)
Shuhui Kang, Vivek M. Prabhu, B D. Vogt, Eric K. Lin, Wen-Li Wu, Karen Turnquest
The reaction-diffusion mechanism of photoacids is dependent upon many variables including the reaction rate, size of the acid counterion species and temperature. Recent experiments have demonstrated the acid diffusion can be controlled by a combination of

Fundamentals of the Reaction-Diffusion Process in Model EUV Photoresists

March 1, 2006
Author(s)
Kristopher Lavery, George Thompson, Hai Deng, D S. Fryer, Kwang-Woo Choi, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, Michael Leeson, Heidi B. Cao
More demanding requirements are being made of photoresist materials for fabrication of nanostructures as the feature critical dimensions (CD) decrease. For EUV resists, control of line width roughness (LWR) and high resist sensitivity are key requirements

Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists

February 19, 2006
Author(s)
Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Karen Turnquest, W D. Hinsberg
The dissolution of partially deprotected chemically amplified photoresists is the final step in printing lithographic features. Since this process step can be tuned independently from the design of the photoresist chemistry, fundamental measurements of the

Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films

July 19, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Eric K. Lin, Jack F. Douglas, Sushil K. Satija, D L. Goldfarb, H Ito
The depth profile of the counterion concentration within thin polyelectrolyte films was measured in situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution.Wefind substantial counterion

Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films

May 20, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Jack F. Douglas, Eric K. Lin, Sushil K. Satija, D M. Goldfarb, H Ito
A depth profile of the counterion concentration within thin polyelectrolyte films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial counterion
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