June 1, 2003
Author(s)
Hae-Jeong Lee, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Eric K. Lin, Wen-Li Wu
X-ray porosimetry is used to characterize structural characteristics, including pore size distribution, average density, wall density, and porosity, of methylsilsesquioxane based porous low-k dielectric films with varying porogen loading contents. When the