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Characterization of Pore Structure in Nanoporous Low-Dielectric Constant Thin Film by Neutron Porosimetry X-Ray Porosimetry

Published

Author(s)

R C. Hedden, Hae-Jeong Lee, Christopher L. Soles, Barry J. Bauer

Abstract

A small-angle neutron scattering (SANS) porosimetry technique is presented for characterization of pore structure in nanoporous thin films. The technique is applied to characterize a spin-on organosilicate low dielectric constant (low-k) material with a random pore structure. Porosimetry experiments are conducted using a contrast match solvent (a mixture of toluene-d8 and toluene-h8) having the same neutron scattering length density as that of the nanoporous film matrix. The film is exposed to contrast match toluene vapor in a carrier gas (air), and pores fill with liquid by capillary condensation. The partial pressure of the solvent vapor is increased stepwise from 0 (pure air) to P0 (saturated solvent vapor), and then decreased stepwise to 0 (pure air). As the solvent partial pressure increases, pores fill with liquid solvent progressively from smallest to largest.
Citation
Langmuir
Volume
20

Keywords

film density, neutron scattering porosimetry, porosity, porous low-k dielectric material, small-angle neutron scattering, x-ray porosimetry

Citation

Hedden, R. , Lee, H. , Soles, C. and Bauer, B. (2004), Characterization of Pore Structure in Nanoporous Low-Dielectric Constant Thin Film by Neutron Porosimetry X-Ray Porosimetry, Langmuir, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852279 (Accessed April 25, 2024)
Created July 2, 2004, Updated February 19, 2017