U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications by: Wen-Li Wu (Assoc)

Search Title, Abstract, Conference, Citation, Keyword or Author
Displaying 76 - 100 of 193

Water Immersion of Model Photoresists: Interfacial Influences on Water Concentration and Surface Morphology

February 1, 2005
Author(s)
B D. Vogt, D L. Goldfarb, M Angelopoulos, Christopher Soles, C M. Wang, Vivek Prabhu, P M. McGuiggan, Jack F. Douglas, Eric K. Lin, Wen-Li Wu, Sushil K. Satija
Immersion lithography has emerged as an alternative to the 157 nm node and as such understanding of the interactions between the photoresist and immersion fluid (water) has become a pressing issue. The water concentration within the model photoresist films

Substrate Influence on Moisture Absorption Into Thin Poly(vinyl pyrrolidone) Films

January 1, 2005
Author(s)
B D. Vogt, Christopher L. Soles, Hae-Jeong Lee, Eric K. Lin, Wen-Li Wu
The influence of substrate surface energy on the swelling of poly(vinyl pyrrolidone) (PVP) films was examined using x-ray reflectivity (XR) and quartz crystal microbalance (QCM) measurements. Two different silicon surface treatments were used for the PVP

Formation of Deprotected Fuzzy Blobs in Chemically Amplified Resists

September 1, 2004
Author(s)
Ronald L. Jones, C G. Willson, T Hu, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos, B C. Trinque, G M. Schmidt, M D. Stewart
The requirement of nanometer dimensional control in photolithographic patterning underlies the future of emerging technologies including next generation semiconductors, nanofluidics, photonics, and microelectronic machines (MEMs). Dimensional control is

Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists

July 1, 2004
Author(s)
Ronald L. Jones, Vivek M. Prabhu, D M. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, M Angelopoulos
A model bilayer geometry is used to examine fundamental contributions of in-situ reaction front profile width on resulting line edge roughness after development in standard 0.26 N tetramethyl ammonium hydroxide aqueous base developer. The bilayer geometry

Structure Characterization of Porous Interlevel Dielectric Films

June 21, 2004
Author(s)
Wen-Li Wu, Eric K. Lin, Christopher L. Soles
To extend the dielectric constant of interlevel dielectrics below a value of ~2.6 seen in today s IC chips, porous low-k material has been evaluated as a viable candidate by industries. In this paper, the current status and the future need in metrologies

Interfacial Effects on Moisture Absorption in Thin Polymer Films

June 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, C M. Wang, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, D L. Goldfarb, M Angelopoulos
Moisture absorption in model photoresist films of poly(4-hydroxystryene) (PHOSt) and poly(tert-butoxycarboxystyrene) (PBOCSt) was measured by x-ray and neutron reflectivity. The degree of swelling in the films upon moisture exposure was found to be

X-Ray and Neutron Porosimetry as Powerful Methodologies for Determining Structural Characteristics of Porous Low-k Thin Films

June 1, 2004
Author(s)
Hae-Jeong Lee, B D. Vogt, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Wen-Li Wu, Eric K. Lin, Gwi-Gwon Kang, Min-Jin Ko
Methylsilsesquioxane based porous low-k dielectric films with varying porogen loading have been characterized using X-ray and neutron porosimetry to determine their pore size distribution, average density, wall density, porosity, density profiles, and

Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists

May 1, 2004
Author(s)
Vivek M. Prabhu, M Wang, E Jablonski, B D. Vogt, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos, H Ito
Organic polar solvent (1-butanol) versus aqueous base (tetramethylammonium hydroxide, (TMAH)) development quality are distinguished by neutral versus charged polymer (polyelectrolyte) dissolution behavior of photoresist bilayers on silicon substrates

Comparative Specular X-Ray Reflectivity, Positron Annihilation Lifetime Spectroscopy, and Incoherent Neutron Scattering Measurements of the Dynamics in Thin Polycarbonate Films

April 1, 2004
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, H G. Peng, D W. Gidley
The manner in which the dynamics of a polymer are affected by thin film confinement is one of technological significance, impacting thin film applications such as lubricants, adhesives, and chemically amplified photoresists. In this manuscript we use

Unusual Expansion and Contraction in Ultrathin Glassy Polycarbonate Films

April 1, 2004
Author(s)
Christopher L. Soles, Jack F. Douglas, Ronald L. Jones, Wen-Li Wu
The thermal expansion behavior and glass transitions of poly(styrene) (PS) and poly(methyl methacrylate) (PMMA) are extensively studied in the thin film geometry. Both PS and PMMA are similar in that they possess very low entanglement densities. In this

Brillouin Scattering Studies of Polymeric Nanostructures

March 1, 2004
Author(s)
R Hartschuh, A Mahorowala, Y Ding, J H. Roh, A Kisliuk, Alexei Sokolov, Christopher Soles, Ronald L. Jones, T J. Hu, Wen-Li Wu
Polymers are now being patterned into nanometer-sized features via optical and/or imprint lithography for a range of applications, including semiconductors, Micro-Electro- Mechanical systems (MEMS), and Nano-Electro-Mechanical systems (NEMS). In these

Water Absorption in Thin Photoresist Films

February 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin
In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a