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Search Publications by Andras E. Vladar

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Displaying 1 - 25 of 178

Metrology for the next generation of semiconductor devices

Ndubuisi G. Orji, Mustafa Badaroglu, Bryan M. Barnes, Carlos Beitia, Benjamin D. Bunday, Umberto Celano, Regis J. Kline, Mark Neisser, Yaw S. Obeng, Andras Vladar
The semiconductor industry continues to produce ever smaller devices that are ever more complex in shape and contain ever more types of materials. The ultimate

Research Update: Electron beam-based metrology after CMOS

James A. Liddle, Brian D. Hoskins, Andras Vladar, John S. Villarrubia
The strengths of and challenges facing electron-based metrology for post-CMOS technology are reviewed. Directed self-assembly, nanophotonics/plasmonics, and

3D Nanometrology Based on SEM Stereophotogrammetry

Vipin N. Tondare, John S. Villarrubia, Andras Vladar
Three-dimensional (3D) reconstruction of a sample surface from scanning electron microscope (SEM) images taken at two perspectives has been known for decades

Contour Metrology using Critical Dimension Atomic Force Microscopy

Ndubuisi G. Orji, Ronald G. Dixson, Boon Ping Ng, Andras Vladar, Michael T. Postek
The critical dimension atomic force microscope (CD-AFM) has been proposed as an instrument for contour measurement and verification – since its capabilities are

NIST-TAPPI Workshop on Measurement Needs for Cellulose Nanomaterial

Chelsea S. Davis, Robert J. Moon, Sean Ireland, Linda Johnston, Jo Anne Shatkin, Kim Nelson, E. J. Foster, Aaron M. Forster, Michael T. Postek, Andras Vladar, Jeffrey W. Gilman
A one-day workshop focused on the Measurement Needs for Cellulosic Nanomaterials was organized by the National Institute of Standards and Technology and held in