Yamane, W.
, Westly, D.
, Holland, G.
, Yamazawa, Y.
, Ito, N.
, Vladar, A.
and Villarrubia, J.
(2025),
Multi-technique reference measurement of critical dimension and shape for model validation in scanning electron microscopy, Metrology, Inspection, and Process Control XXXIX, San Jose, CA, US, [online], https://doi.org/10.1117/12.3046309, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=959651
(Accessed June 3, 2025)
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Multi-technique reference measurement of critical dimension and shape for model validation in scanning electron microscopy
Published
Author(s)
Wataru Yamane, , , Yu Yamazawa, Naoto Ito, ,
Abstract
In semiconductor device manufacturing, 3D structure measurements of newly complex devices would be valuable alongside conventional scanning electron microscopy (SEM) and critical dimension SEM (CD-SEM) measurements. Since these applications in SEM directly utilize grayscale signal intensity, accurate measurement needs a correct understanding of the physics that links intensity to structure. However, many unsolved aspects remain in SEM models. For model validation, we measured the same topography using different techniques. With e-beam lithography, we patterned line/space arrays on a thin, flat silicon membrane. We acquired images of the same features using secondary electrons in SEM and transmitted electrons in scanning transmission electron microscopy (STEM). We compared them with a subsequent image section by focused ion-beam at the same location. The determined discrepancy of line heights was 6.3 nm ± 6.1 nm. The 6.1 nm is an expanded uncertainty equal to three times the combined standard uncertainty, derived from several components that will be described. Our findings contribute to a wide range of measurements in SEM and STEM, providing insights that can potentially be useful for combined metrology in the future.Proceedings Title
Metrology, Inspection, and Process Control XXXIX
Volume
13426
Conference Dates
February 23-27, 2025
Conference Location
San Jose, CA, US
Conference Title
SPIE Advanced Lithography + Patterning
Pub Type
Conferences
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Keywords
scanning electron microscopy (SEM), scanning transmission electron microscopy (STEM), Simulation, Scattering Models, Library based metrology, Combined metrology, Hybrid metrology
Citation
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Created April 22, 2025, Updated June 3, 2025