Publications

Displaying 26 - 50 of 373

3D Nanometrology Based on SEM Stereophotogrammetry

September 18, 2017

Author(s)

Vipin N. Tondare, John S. Villarrubia, Andras Vladar

Three-dimensional (3D) reconstruction of a sample surface from scanning electron microscope (SEM) images taken at two perspectives has been known for decades. However, this method has not been widely used in the semiconductor industry for 3D measurements

Ionizing Radiation Processing and its Potential in Advancing Biorefining and Nanocellulose Composite Materials Manufacturing

September 1, 2017

Author(s)

Michael T. Postek, Dianne L. Poster, Andras Vladar, Mark S. Driscoll, Jay A. LaVerne, Zios Tsinas, Mohamad Al-Sheikhly

Nanocellulose is a high value material that has gained increasing attention because of its high strength, stiffness, unique photonic and piezoelectric properties, high stability and uniform structure. Through utilization of a biorefinery concept

Assessing Scanning Electron Microscopy Stereophotogrammetry Algorithms with Virtual Test Samples

March 20, 2017

Author(s)

John S. Villarrubia, Vipin Tondare, Andras E. Vladar

Modern electronic devices are non-planar and have functional dependencies on device sizes in all three dimensions. Scanning electron microscope (SEM) images have spatial resolution at the needed nanometer level, but like most microscope images they are

Nanoelectronics Dimensional Metrology: Understanding the Differences between Secondary and Backscattered Electron Imaging

March 20, 2017

Author(s)

Michael T. Postek, Andras E. Vladar, John S. Villarrubia

In many fields of research and production, a great deal of dimensional metrology, characterization and process control is accomplished using scanning electron microscopes (SEM). The accuracy of these SEM measurements has always been important, but is often

Contour Metrology using Critical Dimension Atomic Force Microscopy

December 15, 2016

Author(s)

Ndubuisi G. Orji, Ronald G. Dixson, Boon Ping Ng, Andras Vladar, Michael T. Postek

The critical dimension atomic force microscope (CD-AFM) has been proposed as an instrument for contour measurement and verification since its capabilities are complementary to the widely used scanning electron microscope (SEM). Although data from CD-AFM

Nanomanufacturing Concerns about Measurements Made in the SEM Part V. Dealing with Noise

September 17, 2016

Author(s)

Michael T. Postek, Andras Vladar

Scanning electron microscopes (SEM) are used extensively in research and advanced manufacturing for materials characterization, metrology and process control. Unfortunately, noise can limit the specimen-specific detail and information that can be acquired

Comparison of Electron Imaging Modes for Dimensional Measurements in the Scanning Electron Microscope

July 25, 2016

Author(s)

Michael T. Postek, Andras Vladar, John S. Villarrubia

Linewidth measurements from secondary electron (SE) images were compared to those from backscattered electron (BSE) and low-loss electron (LLE) images. With the commonly used 50 % threshold criterion, the lines appeared larger in the SE images. Since the

Method for measuring the diameter of polystyrene latex reference spheres by atomic force microscopy

June 30, 2016

Author(s)

John A. Dagata, Premsagar P. Kavuri, Andras Vladar, Kensei Ehara, Natalia Farkas, Chung-Lin Wu, Hiroshi Itoh

This report presents a correlated height and width measurement model for particle size analysis of spherical particles by atomic force microscopy (AFM). It is complementary to more familiar methods based on a single value of the particle height or on a

Virtual rough samples to test 3D nanometer-scale SEM stereo photogrammetry

March 22, 2016

Author(s)

John S. Villarrubia, Vipin N. Tondare, Andras Vladar

The combination of SEM for high spatial resolution, images from multiple angles to provide 3D information, and commercially available stereo photogrammetry software for 3D reconstruction offers promise for dimensional metrology in 3D. A method is described

Strategies for scanning electron microscopy sample preparation and characterization of multiwall carbon nanotube polymer composites

January 20, 2016

Author(s)

Andras Vladar

This guideline presents methods for the preparation and investigation of samples of multiwall carbon nanotube-polymer composites by scanning electron microscopy. It is focused on multiwall carbon nanotube epoxy composite, but the strategy should be

Does Your SEM Really Tell the Truth?-How Would You Know? Part 4: Charging and its Mitigation

January 19, 2016

Author(s)

Michael T. Postek, Andras E. Vladar

This is the fourth part of a series of tutorial papers discussing various causes of measurement uncertainty in scanned particle beam instruments. Scanned particle beam instruments especially the scanning electron microscope (SEM) have gone through

Nanomanufacturing Concerns about Measurements Made in the SEM Part IV: Charging and its Mitigation

November 17, 2015

Author(s)

Michael T. Postek, Andras Vladar

This is the fourth part of a series of tutorial papers discussing various causes of measurement uncertainty in scanned particle beam instruments, and some of the solutions researched and developed at NIST and other research institutions. Scanned particle

Optimizing Hybrid Metrology: Rigorous Implementation of Bayesian and Combined Regression.

November 12, 2015

Author(s)

Mark Alexander Henn, Richard M. Silver, John S. Villarrubia, Nien F. Zhang, Hui Zhou, Bryan M. Barnes, Andras Vladar, Bin Ming

Hybrid metrology, e.g. the combination of several measurement techniques to determine critical dimensions, is an important approach to meet the needs of semiconductor industry. A proper use of hybrid metrology may not only yield more reliable estimates for

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