NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy

Published

Author(s)

Min-Ho Rim, Emil Agocs, Ronald G. Dixson, Premsagar P. Kavuri, Andras Vladar, Ravikiran Attota
Citation
Journal of Vacuum Science and Technology B
Pub Type
Journals

Download Paper

Local Download

Keywords

Semiconductor fabrication, contamination, detection, defects, TSOM
Optical / photometry / laser metrology, Nanometrology and Nanoelectronics

Citation

Rim, M. , Agocs, E. , Dixson, R. , Kavuri, P. , Vladar, A. and Attota, R. (2020), Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=928754 (Accessed October 17, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created August 27, 2020, Updated October 12, 2021
Was this page helpful?