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Search Publications by: James K. Olthoff (Assoc)

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Displaying 1 - 25 of 272

Electrical Units in the New SI: Saying Goodbye to the 1990 Values

May 12, 2016
Author(s)
Nick Fletcher, Gert Rietveld, James K. Olthoff, Ilya F. Budovsky
The proposed redefinition of several SI base units is a topic that has been on the metrology agenda for the last decade. The general principles and the motivation for the changes have been presented at the NCSLI several times. However, recent progress on

The NIST Plan for Providing Public Access to Results of Federally Funded Research

October 27, 2015
Author(s)
Katherine E. Sharpless, Regina L. Avila, Sally S. Bruce, Wo L. Chang, Robert M. Dimeo, Virginia Covahey, Alan K. Dohne, Heather M. Evans, Aaron P. Fein, Donna J. Kimball, Andrea M. Medina-Smith, Alan E. Munter, James K. Olthoff, Dianne L. Poster, Kathleen M. Roberts, Susannah B. Schiller, John H. Scott, Barbara P. Silcox, James A. St Pierre, Mark D. Stiles
Documentation of the evolution of NIST's plan for providing public access to results of federally funded research is provided, including the plan itself, responses to comments made by NIST staff, and public comments received in response to a request for

Fundamental Electron Interactions with Plasma Processing Gases

November 1, 2003
Author(s)
Loucas G. Christophorou, James K. Olthoff
This volume deals with the basic knowledge and undestanding of fundamtal interactions of low energy electrons with molecules. It provides an up-to-date and comprehensive account of the fundamental interactions of low energy energy electrons with molecules

Electricity Division Programs, Activities, and Accomplishments

May 21, 2003
Author(s)
James K. Olthoff, Barry A. Bell
This book describes the research programs, activities, and recent accomplishments of the Electricity Division organized by research project. After the project descriptions is a list of the calibration services that the Division provides, NRC Postdoctoral

Electron Interactions with BCL 3

December 1, 2002
Author(s)
Loucas G. Christophorou, James K. Olthoff
In this paper we review and assess the cross sections for collisions of low-energy electrons with boron trichloride (BCI3). The only available experimental cross section data are for partial and total ionization and electron attachment, and the electron

Measured cross sections and ion energies for a CHF 3 discharge.

August 1, 2002
Author(s)
B. Peko, R. Champion, MVVS. Rao, James K. Olthoff
Trifluoromenthane (CHF 3) is used in semiconductor plasma processing chambers to achieve high etch selectivity of an oxide layer over a silicon substrate. Such surface etching is governed by the ion and molecule fluxes near the surface, the concentrations