U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications by: James K. Olthoff (Fed)

Search Title, Abstract, Conference, Citation, Keyword or Author
Displaying 1 - 25 of 136

Electrical Units in the New SI: Saying Goodbye to the 1990 Values

May 12, 2016
Author(s)
Nick Fletcher, Gert Rietveld, James K. Olthoff, Ilya F. Budovsky
The proposed redefinition of several SI base units is a topic that has been on the metrology agenda for the last decade. The general principles and the motivation for the changes have been presented at the NCSLI several times. However, recent progress on

The NIST Plan for Providing Public Access to Results of Federally Funded Research

October 27, 2015
Author(s)
Katherine E. Sharpless, Regina L. Avila, Sally S. Bruce, Wo L. Chang, Robert M. Dimeo, Virginia Covahey, Alan K. Dohne, Heather M. Evans, Aaron P. Fein, Donna J. Kimball, Andrea M. Medina-Smith, Alan E. Munter, James K. Olthoff, Dianne L. Poster, Kathleen M. Roberts, Susannah B. Schiller, John H. Scott, Barbara P. Silcox, James A. St Pierre, Mark D. Stiles
Documentation of the evolution of NIST's plan for providing public access to results of federally funded research is provided, including the plan itself, responses to comments made by NIST staff, and public comments received in response to a request for

Fundamental Electron Interactions with Plasma Processing Gases

November 1, 2003
Author(s)
Loucas G. Christophorou, James K. Olthoff
This volume deals with the basic knowledge and undestanding of fundamtal interactions of low energy electrons with molecules. It provides an up-to-date and comprehensive account of the fundamental interactions of low energy energy electrons with molecules

Electricity Division Programs, Activities, and Accomplishments

May 21, 2003
Author(s)
James K. Olthoff, Barry A. Bell
This book describes the research programs, activities, and recent accomplishments of the Electricity Division organized by research project. After the project descriptions is a list of the calibration services that the Division provides, NRC Postdoctoral

Electron Interactions with BCL 3

December 1, 2002
Author(s)
Loucas G. Christophorou, James K. Olthoff
In this paper we review and assess the cross sections for collisions of low-energy electrons with boron trichloride (BCI3). The only available experimental cross section data are for partial and total ionization and electron attachment, and the electron

Measured cross sections and ion energies for a CHF 3 discharge.

August 1, 2002
Author(s)
B. Peko, R. Champion, MVVS. Rao, James K. Olthoff
Trifluoromenthane (CHF 3) is used in semiconductor plasma processing chambers to achieve high etch selectivity of an oxide layer over a silicon substrate. Such surface etching is governed by the ion and molecule fluxes near the surface, the concentrations

Electron Attachment Cross Sections and Negative Ion States of SF6

January 1, 2001
Author(s)
Loucas G. Christophorou, James K. Olthoff
A comprehensive and critical assessment of published data on the total, dissociative, and nondissociative electron attachment cross sections for SF 6 allowed us to recommend or suggest room temperature values for these cross sections over an energy range

Electron Interactions with c-C 4 F 8

January 1, 2001
Author(s)
Loucas G. Christophorou, James K. Olthoff
The limited electron collision cross-section and transport-coefficient data for the plasma processing gas perfluorocyclobutane (c-C 4F 8) are synthesized, assessed, and discussed. These include cross sections for total electron scattering, differential

Electron Collision Data for Plasma-Processing Gases

October 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
Low-temperature plasma applications require detailed understanding of the physical and chemical processes occurring in the plasmas themselves. For instance, as the push for smaller feature sizes and higher quality devices in the semiconductor industry has

Electron Interactions with Excited Atoms and Molecules

October 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
Elastic, inelastic, and superelastic scattering of electrons by and electron-impact ionization of excited atoms are reviewed and discussed and the role of the electric dipole polarizabilty in the interaction of slow electrons with excited atoms is

Electron Interactions with SF 6

September 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
We have comprehensively reviewed and critically assessed the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF 6. In this paper are presented our: (1) assessed data for the total electron scattering, elastic

Inductively Coupled Plasmas in Low Global Warming Potential Gases

August 1, 2000
Author(s)
Amanda N. Goyettes, Yicheng Wang, James K. Olthoff
Many high density discharges used in microelectronics fabrication use fluorocarbon gases with coincidentally high global-warming potentials (GWPs). We have determined the identities, fluxes, and energy distributions of ions produced in high density