Fletcher, N.
, Rietveld, G.
, Olthoff, J.
and Budovsky, I.
(2014),
Predicted impact of latest h and e values on resistance and voltage traceability in the new SI (Systeme International), Conference on Precision Electromagnetic Measurements, Rio de Janeiro, BR, [online], https://doi.org/10.1109/CPEM.2014.6898444
(Accessed October 16, 2024)