Christophorou, L.
and Olthoff, J.
(2003),
Fundamental Electron Interactions with Plasma Processing Gases, Fundamental Electron Interactions with Plasma Processing Gases
(Accessed July 30, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Fundamental Electron Interactions with Plasma Processing Gases
Published
Author(s)
Loucas G. Christophorou,
Abstract
This volume deals with the basic knowledge and undestanding of fundamtal interactions of low energy electrons with molecules. It provides an up-to-date and comprehensive account of the fundamental interactions of low energy energy electrons with molecules of current interest in modern technology, especially the semiconductor industry.Citation
Fundamental Electron Interactions with Plasma Processing Gases
Pub Type
Others
Keywords
BCl3, c-C4F8, C2F6, C3F8, CF4, CHF3, Cl2, electron impact, electron interactions, electron scattering
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created October 31, 2003, Updated October 12, 2021