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Fundamental Electron Interactions with Plasma Processing Gases

Published

Author(s)

Loucas G. Christophorou, James K. Olthoff

Abstract

This volume deals with the basic knowledge and undestanding of fundamtal interactions of low energy electrons with molecules. It provides an up-to-date and comprehensive account of the fundamental interactions of low energy energy electrons with molecules of current interest in modern technology, especially the semiconductor industry.
Citation
Fundamental Electron Interactions with Plasma Processing Gases

Keywords

BCl3, c-C4F8, C2F6, C3F8, CF4, CHF3, Cl2, electron impact, electron interactions, electron scattering

Citation

Christophorou, L. and Olthoff, J. (2003), Fundamental Electron Interactions with Plasma Processing Gases, Fundamental Electron Interactions with Plasma Processing Gases (Accessed June 19, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 31, 2003, Updated October 12, 2021