U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications

NIST Authors in Bold

Displaying 45526 - 45550 of 74024

Ultimate Capacities of Low-Rise Steel Frames in Turbulent Wind

July 1, 2001
Author(s)
S Jang, L L. Lu, Fahim H. Sadek, Emil Simiu
This paper is a derivative of G2001-1392, Database-Assisted Wind Load Capacity Estimates for Low-Rise Steel Frames, by Jang, S., et al., intended for publication in the Journal of Structural Engineering.The original paper's abstract was:A comparative study

Ultrastable Laser Array at 633 nm for Real-Time Dimensional Metrology

July 1, 2001
Author(s)
John R. Lawall, J Pedulla, Y LeCoq
We describe a laser system for very high-accuracy dimensional metrology. A sealed-cavity helium-neon laser is offset-locked to an iodine-stabilized laser in order to realize a secondary standard with higher power and less phase noise. Synchronous averaging

What to Expect When You Can Not Start at the Beginning

July 1, 2001
Author(s)
David E. Cypher
This presentation contains background information on the decision to create an Specification and Description Language (SDL) model, a discussion of the development cycle for the product development, a description of the SDL's creation, an explanation on how

X-Ray Scattering and Imaging From Plastically Deformed Metals

July 1, 2001
Author(s)
Gabrielle G. Long, Lyle E. Levine, Richard J. Fields
New ultra-small-angle X-ray scattering (USAXS) facilities at 3rd generation synchrotron sources enjoy an additional 1 to 3 decades of X-ray brilliance over 2nd generation instruments, and can now quantify microstructural features from 3nm to 1.3 m in size

Compensation for Stray Light in Projection Display Metrology

June 30, 2001
Author(s)
Paul A. Boynton, Edward F. Kelley
Electronic projection display specifications are often based on measurements made in ideal darkroom conditions and assume ideal measurement instrumentation. However, not everyone has access to such a facility, and not always will the light-measuring

Critical Dimension Metrology in the Scanning Electron Microscope

June 29, 2001
Author(s)
Michael T. Postek, Andras Vladar
Metrology is a principal enabler for the development and manufacture of current and future generations of semiconductor devices. With the potential of 130, 100 nanometer and even smaller linewidths and high aspect ratio structures, the scanning electron

A Reference Tristimulus Colorimeter

June 25, 2001
Author(s)
George P. Eppeldauer
The accuracy of tristimulus colorimeters can be increased by using detector standards instead of traditional lamp standards for calibration. After high accuracy absolute spectral response determination of the color channels, spectral and amplitude

Security - Revenue Generator and Mission Enabler

June 21, 2001
Author(s)
G Stoneburner
We need to facilitate a change in user perception of security from a hindrance to an essential revenue generator and mission enabler. The Common Criteria protection profile (PP) and security target (ST) constructs can be used to help achieve this need. Yet

Workshop on Fire Testing Measurement Needs: Proceedings

June 19, 2001
Author(s)
William L. Grosshandler
This report describes the proceedings of a workshop held on June 18 and 19, 2001, at NIST in Gaithersburg to identify where science and technology can better prepare fire testing laboratories and their customers to meet these challenges. Topics that were

Interpretation of Resonant Photoemission Spectra of Solid Actinide Systems

June 15, 2001
Author(s)
S Molodtsov, S Halilov, M Richter, A Zangwill, C Laubschat
It is shown that angle-resolved valence-band photoemission (PE) spectra of epitaxial close-packed films of U metal may correctly be described within a one-step model of PE based on a band description of the U 5f states. It is found that a cross-section

High Temperature Characteristics of 5kV, 20 A 4H-SiC PiN Rectifiers

June 7, 2001
Author(s)
Ranbir Singh, Allen R. Hefner Jr., David W. Berning, M. Palmer
This paper reports in detail, the design, a manufactuable fabrication process, and high temperature characteristics of a 4H-SiC rectifier with a 5 kV, 20 A rating. A highly doped p-type epitaxial Anode layer and junction termination extension (JTE) were

Interferometric Figure Metrology; Enabling In-House Traceability

June 6, 2001
Author(s)
Christopher J. Evans, Angela Davies, Tony L. Schmitz, R E. Parks
The basic goal of the Advanced Optics Metrology program at NIST''s Manufacturing Engineering Laboratory is to help industry ensure that their measurement results of optical figure and wavefront are traceable. This paper underscores the importance of
Displaying 45526 - 45550 of 74024
Was this page helpful?