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Search Publications

NIST Authors in Bold

Displaying 2276 - 2300 of 4197

Stylus Flight in Surface Profiling

January 1, 1996
Author(s)
Jun-Feng Song, Theodore V. Vorburger
… Journal of Manufacturing Science and Engineering-Transactions of the ASME …

A Theory of Intelligent Systems

January 1, 1992
Author(s)
James S. Albus
… Chapter in Manufacturing & Automation Systems: Techniques & Technologies …

Control of Flexible Robot Arm

December 31, 1987
Author(s)
Jonathan W. Lee, L Haynes, B Wang, T M. Tsai
… Modelings and Control of Robotic Manipulators and Manufacturing Processes …

Nano- and Atom-scale Length Metrology

October 1, 2010
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Richard A. Allen, Michael W. Cresswell, Vincent A. Hackley
… of length at the nano-scale have increasing importance in manufacturing, especially in the electronics and biomedical …

A critical evalution of thermal mass flow meters

January 5, 1996
Author(s)
S A. Tison
Many semiconductor processes require that stable and known flows of gas be delivered to the processing chamber. The thermal mass flow meter (TMFM) is used almost exclusively in the semiconductor industry for the admission of process gases. While TMFM’s have

Proprietary Design Information and Fruit Pies

November 7, 2008
Author(s)
John A. Horst
The proliferation of proprietary design info exchange formats is causing high costs to manufacturers. The standards solution is offered as both attainable and worth the effort. A design information exchange standards development life-cycle is proposed.

IP Security in Structured ASIC: Challenges and Prospects

September 25, 2024
Author(s)
Rasheed Almawzan, Sudipta Paria, Aritra Dasgupta, Kostas Amberiadis, Swarup Bhunia
… With the globalization of hardware manufacturing and the growing demand for electronics, … rely on offshore facilities for most of the design and manufacturing processes, including emerging technologies like …

Certification of Standard Reference Material 3289 Multivitamin Tablets

March 18, 2022
Author(s)
Hugh Hayes, Jerome Mulloor, Michael Nelson, Kate Rimmer, Lee L. Yu, James H. Yen
Standard Reference Material® (SRM®) 3289 Multivitamin Tablets was developed as part of a collaborative effort between the National Institute for Standards and Technology (NIST) and the National Institutes of Health Office of Dietary Supplements (NIH ODS)

Chip Scale Atomic Devices

August 14, 2018
Author(s)
John E. Kitching
Chip-scale atomic devices combine elements of precision atomic spectroscopy, silicon micromachining and advanced diode laser technology to create compact, low-power and manufacturable instruments with high precision and stability. We review the design

Nano- and Atomic-Scale Length Metrology

January 1, 2006
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu
… quantities require accurate metrology to determine whether manufacturing specifications are being met. Calibrated step …

Interferometric Thickness Calibration of 300mm Silicon Wafers

July 20, 2005
Author(s)
Quandou (. Wang, Ulf Griesmann, Robert S. Polvani
The Improved Infrared Interferometer (IR3) at the National Institute of Standards and Technology (NIST) is a phase-measuring interferometer, operating at a wavelength of 1550 nm, which is being developed for measuring the thickness and thickness variation
Displaying 2276 - 2300 of 4197
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