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Nano- and Atom-scale Length Metrology

Published

Author(s)

Theodore V. Vorburger, Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Richard A. Allen, Michael W. Cresswell, Vincent A. Hackley

Abstract

Measurements of length at the nano-scale have increasing importance in manufacturing, especially in the electronics and biomedical industries. The properties of linewidth and step height are critical to the function and specification of semiconductor devices. The ability to manufacture small particles of controlled sizes is critical for developing diagnostic and therapeutic products in the rapidly growing biomedical industries. We review here four topics associated with calibrated measurements of nano-scale lengths at NIST: measurements of linewidth by critical dimension atomic force microscopy (CD-AFM), measurements of 0.3 nm and 1 nm lattice based step height standards with a calibrated AFM, international comparisons in nanometrology among national measurement institutes, and gold-nanoparticle Reference Materials with nominal sizes of 10 nm, 30 nm, and 60 nm.
Conference Dates
October 25-27, 2010
Conference Location
Worcester, MA
Conference Title
2nd International Conference on Surface Metrology

Keywords

nanometrology, calibration, atomic force microscopy, nanoparticles, linewidth, step height, international comparison

Citation

Vorburger, T. , Dixson, R. , Orji, N. , Fu, J. , Allen, R. , Cresswell, M. and Hackley, V. (2010), Nano- and Atom-scale Length Metrology, 2nd International Conference on Surface Metrology, Worcester, MA (Accessed June 19, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 1, 2010, Updated February 19, 2017