Theodore V. Vorburger, Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Richard A. Allen, Michael W. Cresswell, Vincent A. Hackley
Measurements of length at the nano-scale have increasing importance in manufacturing, especially in the electronics and biomedical industries. The properties of linewidth and step height are critical to the function and specification of semiconductor devices. The ability to manufacture small particles of controlled sizes is critical for developing diagnostic and therapeutic products in the rapidly growing biomedical industries. We review here four topics associated with calibrated measurements of nano-scale lengths at NIST: measurements of linewidth by critical dimension atomic force microscopy (CD-AFM), measurements of 0.3 nm and 1 nm lattice based step height standards with a calibrated AFM, international comparisons in nanometrology among national measurement institutes, and gold-nanoparticle Reference Materials with nominal sizes of 10 nm, 30 nm, and 60 nm.
October 25-27, 2010
2nd International Conference on Surface Metrology
nanometrology, calibration, atomic force microscopy, nanoparticles, linewidth, step height, international comparison
, Dixson, R.
, Orji, N.
, Fu, J.
, Allen, R.
, Cresswell, M.
and Hackley, V.
Nano- and Atom-scale Length Metrology, 2nd International Conference on Surface Metrology, Worcester, MA
(Accessed November 28, 2023)