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Metrology

Optical/photometry/laser metrology

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Displaying 226 - 250 of 383

High Resolution Surface Plasmon Resonance Imaging for Single Cells

November 30, 2014
Author(s)
Alexander Peterson, Michael Halter, Alessandro Tona, Anne Plant
Background Surface plasmon resonance imaging (SPRI) is a label-free technique that can image refractive index changes at an interface. We have previously shown that SPRI can be used to study the dynamics of cell-substratum interactions. However

IR-enhanced Si reference detectors for 1-step scale transfers from 300 nm to 1000 nm

November 20, 2014
Author(s)
George P. Eppeldauer, Thomas Larason, Jeanne Houston, Robert Vest, Uwe Arp, Howard Yoon
IR-enhanced Si photodiodes have improved radiometric and electronic characteristics as compared to other widely used Si photodiodes and can be used as responsivity standards in the wavelength range from 300 nm to 1000 nm. Their low predicted uncertainty

Nanoscale Imaging and Spectroscopy of Plasmonic Modes with the PTIR technique

August 1, 2014
Author(s)
Aaron M. Katzenmeyer, Jungseok Chae, Richard Kasica, Glenn Holland, Basudev Lahiri, Andrea Centrone
The collective oscillation of conduction electrons in plasmonic nanomaterials allows the coupling of propagating light waves with nanoscale volumes of matter ("hot spots") and allows engineering their optical response from the UV to THz as a function of

Advanced phasemeter for deep phase modulation interferometry

July 21, 2014
Author(s)
Thomas Schwarze, Oliver Gerberding, Felipe Guzman, Gerhard Heinzel, Karsten Danzmann
We present the development of an advanced phasemeter for the deep phase modulation interferometry technique. This technique aims for precise length measurements with a high dynamic range using little optical hardware. The advanced phasemeter uses fast ADCs

Spectral Emissivity Measurements

July 10, 2014
Author(s)
Hiromichi Watanabe, Juntaro Ishii, Hidenobu Wakabayashi, Tomoyuki Kumano, Leonard Hanssen
Chapter 9 describes the wide variety of experimental instrumentation and methods used for spectral emissivity measurements at both ambient and elevated temperatures, along with specific examples of materials studied. There are a number of measurement

Dispersive Methods

July 1, 2014
Author(s)
Arnold A. Gaertner, Howard Yoon, Thomas Germer
Chapter 3 will discuss dispersive means of obtaining spectral resolution in spectrophotometry. These methods are used to spatially disperse or separate the various wavelengths of optical electromagnetic radiation to enable analysis of material properties

Chapter 4: Fourier transform methods

April 25, 2014
Author(s)
Simon G. Kaplan, Manuel A. Quijada
Chapter 4 describes the use of Fourier Transform Spectrometers (FTS) for accurate spectrophotometry over a wide spectral range. After a brief exposition of the basic concepts of FTS operation, we discuss instrument designs and discuss their advantages and

Semiconductor-based detectors

December 13, 2013
Author(s)
Sergio Cova, Massimo Ghioni, Mark A. Itzler, Joshua Bienfang, Alessandro Restelli
There is nowadays a widespread and growing interest in low-level light detection and imaging. This interest is driven by the need for high sensitivity in various scientific and industrial applications such as fluorescence spectroscopy in life and material

Wavelength Dependent UV Inactivation and DNA Damage of Adenovirus 2 as Measured by Cell Culture Infectivity and Long Range Quantitative PCR

November 22, 2013
Author(s)
Sara E. Beck, Roberto A. Rodriguez, Karl G. Linden, Thomas M. Hargy, Thomas C. Larason, Harold B. Wright
Adenovirus is regarded as the most resistant pathogen to ultraviolet (UV) disinfection due to its demonstrated resistance to monochromatic, low-pressure (LP) UV irradiation at 254 nm. This resistance has resulted in high UV dose requirements for all

Achieving Climate Change Absolute Accuracy in Orbit

October 28, 2013
Author(s)
Bruce Wielicki, Joseph P. Rice
The Climate Absolute Radiance and Refractivity Observatory (CLARREO) mission will provide a metrology laboratory in orbit for the purpose of accurately measuring and attributing climate change. CLARREO measurements establish new climate change benchmarks

Strong Casimir force reduction by metallic surface nanostructuring

September 27, 2013
Author(s)
Francesco Intravaia, Stefan T. Koev, Il Woong Jung, Albert A. Talin, Paul S. Davids, Ricardo Decca, Vladimir Aksyuk, Diego A. Dalvit, Daniel Lopez
The Casimir force is a quantum-mechanical interaction arising from vacuum fluctuations of the electromagnetic (EM) field and is technologically significant in micro- and nanomechanical systems. Despite rapid progress in nanophotonics, the goal of

Measuring the UV Action Spectra of Pathogens and Surrogates

September 22, 2013
Author(s)
Karl G. Linden, Harold B. Wright, Sara E. Beck, Thomas M. Hargy, Thomas C. Larason, Randi M. McCuin
The use of bioassays to determine reduction equivalent doses delivered by UV reactors is recognized as an effective measure of UV disinfection systems. Low pressure (LP) UV delivered in controlled collimated beam systems provides dose response curves which

Optical Measurements of OLED Panels for Lighting Applications

July 22, 2013
Author(s)
Tokihisa Kawabata, Yoshi Ohno
Optical characteristics of OLED panels have been investigated for the purpose of developing a test method for OLED panels for lighting applications. The electrical characteristics, total luminous flux and chromaticity (x, y), and their dependence on supply

A microscene approach to the evaluation of hyperspectral system level performance

May 18, 2013
Author(s)
David Allen, Ronald G. Resmini, Christopher Deloye
Assessing the ability of a hyperspectral imaging (HSI) system to detect the presence of a substance or to quantify abundance requires an understanding of the many factors in the end-to-end remote sensing scenario from scene to sensor to data exploitation

Intercomparison between optical and x-ray scatterometry measurements of FinFET structures

April 8, 2013
Author(s)
Paul Lemaillet, Thomas Germer, Regis J. Kline, Daniel Sunday, Chengqing C. Wang, Wen-Li Wu
In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopic
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