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Conferences

Photomask Metrology in the Era of Neolithography

Author(s)
James E. Potzick
The appearance of smaller photomask feature sizes, high density patterns, and optical enhancements such as phase shifters and OPC features, and the increasing

The NIST Electronic Kilogram

Author(s)
David B. Newell, K Fujii, Andrew Gillespie, P. T. Olsen, Alain Picard, Richard L. Steiner, Gerard N. Stenbakken, Edwin R. Williams

Measurement Comparison of Stylus Radii

Author(s)
Jun-Feng Song, Theodore V. Vorburger
Three methods were used for measuring the radii of the same stylus of our stylus instrument. The measurement results were compared and showed good agreement

New NIST-Certified Small Scale Pitch Standard

Author(s)
James E. Potzick
The National Institute of Standards and Technology is developing a dimensional pitch standard covering the range 1 ?m to 10 mm, intended for the calibration of

The dynamics of chip formation in machining

Author(s)
Matthew A. Davies, Christopher J. Evans, Timothy J. Burns
In this paper, we provide experimental, numerical and analytical evidence suggesting that the onset of segmented chip formation is the result of a Hopf
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