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Conferences

FT-IR Based Ellipsometer Using High-Quality Brewster-Angle Polarizers

January 1, 1999

Author(s)

Simon G. Kaplan, Leonard M. Hanssen

Polarized Light Scattering Measurements of Roughness, Subsurface Defects, Particles, and Dielectric Layers on Silicon Wafers, ed. by F. Obelleiro, J.L. Rodr{iacute}guez, and T. Wriedt

January 1, 1999

Author(s)

Thomas A. Germer, L Sung

Improved-accuracy Tristimulus Colorimeters Calibrated with Standard Detectors

January 1, 1999

Author(s)

George P. Eppeldauer

Standard Detector Based Calibration Method for Tristimulus Colorimeters

January 1, 1999

Author(s)

George P. Eppeldauer

Measuring the Geometric Errors of a Hexapod Machine Tool

January 1, 1999

Author(s)

Johannes A. Soons

This paper describes procedures to measure the geometric errors of parallel kinematic machines with a Gough configuration. The procedures are applied to...

Microwave Network Analyzers - A Discussion of Verification Methods

January 1, 1999

Author(s)

Ronald A. Ginley

Verification of Vector Network Analyzers (VNAs) is very important to the measurement process as well as to establish confidence in the uncertainty of the system...

Development of a Glow-Discharge Resonance-Ionization Mass-Spectrometer System for Detector of Radioisotopes in Environmental Samples, ed. by F. Vedel, R.M. Pick, and C. Bastian

January 1, 1999

Author(s)

Leticia S. Pibida, J M. Hutchinson, J Wen

Development of the Neutron Phase Contrast Imaging Technique and Its Application In Materials Science Research

January 1, 1999

Author(s)

David L. Jacobson, Muhammad Arif, L Bergmann, A I. Ioffe

Magnetic Trapping, Evaporative Cooling, and Bose-Einstein Condensates, ed. by S. Hacyan, R. Jauregui, and R. Lopez-Pena

January 1, 1999

Author(s)

S L. Rolston

Ultracold Collisions: Exploring the Quantum Threshold Regime

January 1, 1999

Author(s)

Paul S. Julienne, Eite Tiesinga, P J. Leo, Carl J. Williams

Status of the Development of SRM 640C

January 1, 1999

Author(s)

R Deslattes, J P. Cline, J -. Staudenmann, Ernest G. Kessler, Lawrence T. Hudson, Albert Henins

The Conversion of SURF II to SURF III,

January 1, 1999

Author(s)

Mitchell L. Furst, R M. Graves, A D. Hamilton, L R. Hughey, R P. Madden, Robert E. Vest, W S. Trzeciak, R A. Bosch, L Greenler, P Robl, D Wahl

The Conversion of SURF II to SURF III

January 1, 1999

Author(s)

Mitchell L. Furst, R M. Graves, A D. Hamilton, L R. Hughey, R P. Madden, Robert E. Vest, W S. Trzeciak, R A. Bosch, L Greenler, P Robl, D Wahl

Atomic Spectra Database, 1998

January 1, 1999

Author(s)

William C. Martin

Conference Report First Advanced Encryption Standard (AES) Candidate Conference, Ventura, CA, August 20-22, 1998

January 1, 1999

Author(s)

E Roback, Morris J. Dworkin

On August 20-22, 1998, the National Institute of Standards and Technology (NIST) sponsored the First Advanced Encryption Standard (AES) Candidate Conference in...

The Formation of Supermolecular Polycaprolactone (PCL) Spherulites in Polystyrene-Polybutadiene-PCL (PS-b-PB-b-PCL) Semicrystalline Block Copolymers

January 1, 1999

Author(s)

G Kim, C L. Jackson, V Balsamo, M Libera, R Stadler, Charles C. Han

Optical Studies on Sheared Polymer Droplets

January 1, 1999

Author(s)

Erik K. Hobbie, Kalman D. Migler

Phase Inversion in Viscoelastic Polybutadiene (Pb) Polyisoprene (Pi) Blends

January 1, 1999

Author(s)

H Jeon, A Nakatani, W Hsu, A Halasa, Charles C. Han

Direct Measurement of Slippage Induced by a Polymer Processing Additive

January 1, 1999

Author(s)

Kalman D. Migler, C L. Gettinger, V P. Thalacker, R Conway

NIST Colorimetric Calibration Facility for Displays Colorimeters

January 1, 1999

Author(s)

Steven W. Brown, Yoshihiro Ohno

A facility has been developed at the National Institute of Standards and Technology (NIST) to calibrate color-measuring instruments for displays. The...

Measurement Uncertainty and Uncorrected Bias

January 1, 1999

Author(s)

Steven D. Phillips, K Eberhardt, William T. Estler

This paper discusses the distinction between measurement uncertainty, measurement errors and their role in the calibration process. The issue of including...

Measurement Uncertainty and Noise in Nanometrology

January 1, 1999

Author(s)

James E. Potzick

The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of...

Self-Calibration and Error Compensation Using Reference Position Markers

January 1, 1999

Author(s)

H Zou

In this paper, reference position markers are proposed for self-calibration and error compensation. Self-calibration of x-y motion guides is discussed with a...