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Conferences

Intercomparison of SEM, AFM, and Electrical Linewidths

Author(s)
John S. Villarrubia, Ronald G. Dixson, Samuel N. Jones, J R. Lowney, Michael T. Postek, Richard A. Allen, Michael W. Cresswell
Uncertainty in the locations of line edges dominates the uncertainty budget for high quality sub-micrometer linewidth measurements. For microscopic techniques

Toward Nanometer Accuracy Measurements

Author(s)
John A. Kramar, E Amatucci, David E. Gilsinn, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one

Two-Dimensional Calibration Artifact and Measurement Methodology

Author(s)
Richard M. Silver, Theodore D. Doiron, William B. Penzes, S Fox, Edward A. Kornegay, S Rathjen, M Takac, D Owen
In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank

Software to Optimize the Testing of Mixed-Signal Devices

Author(s)
Gerard N. Stenbakken, Andrew D. Koffman, T. M. Souders
New software is now available to help test and measurement engineers optimize the testing of complex electronic devices. Examples of products that are

Large Area YBa2Cu3O7-x Bolometers on Si Substrates

Author(s)
Leila R. Vale, Ronald H. Ono, Donald G. McDonald, Robert J. Phelan
We have developed YBa 2Cu 3O 7-x (YBCO) thermometers for large-area (4 mm x 4 mm) electrical substitution bolometers. We passivated the YBCO with a thin Au

Assessment Error Sources in Rockwell Hardness Measurements

Author(s)
Walter S. Liggett Jr, Samuel Low, David J. Pitchure, Jun-Feng Song
In the use of hardness test blocks, the uncertainty due to block non-uniformity can be reduced if one is willing to make measurements at specified locations on

Optical Linewidth Models: Then and Now

Author(s)
Robert D. Larrabee, Richard M. Silver, M P. Davidson
In the late 1970's, Dr. Diana Nyyssonen demonstrated that NIST could optically calibrate photomask linewidth standards that were narrower than the classical

Update on a Consumer-Oriented Guide for Surge Protection

Author(s)
Francois D. Martzloff, T. S. Key, D. Nastasi, K. O. Phipps, J. May
Caught among contradictory stories on the need for surge protection as well as unsupported anecdotes of surge-related failures found in some editorial
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