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Conferences

Thermal Imaging of Metals in a Kolsky-Bar Apparatus

Author(s)
Howard W. Yoon, D Basak, Richard L. Rhorer, Eric P. Whitenton, Timothy J. Burns, Richard J. Fields, Lyle E. Levine
For materials testing at elevated temperatures, we describe the design and the development of a resistively heated Kolsky-bar apparatus. The temperature of the...

Recent Progress in Polarization Mode Dispersion Measurement

Author(s)
Kent B. Rochford, Paul Leo, D Peterson, Paul A. Williams
Measurement of polarization mode dispersion (PMD) spans from precise component characterization of differential group delay (DGD) to system characterization of...

Human Identification from Body Shape

Author(s)
Afzal A. Godil, Patrick J. Grother, Sanford P. Ressler
In this paper, we investigate the utility of static anthropometric distances as a biometric for human identification. The 3D landmark data from the CAESAR...

Awareness in Human-Robot Interactions

Author(s)
J L. Drury, Jean C. Scholtz, Holly A. Yanco
This paper provides a set of definitions that form a framework for describing the types of awareness that humans have of robot activities and the knowledge that...

Manufacturing Data Validation Through Simulation

Author(s)
Guodong Shao, Yung-Tsun Lee, Charles R. McLean
In order to ensure that the process plan and numerical control (NC) programs are complete and correct before jobs are released to the shop floor, manufacturing...

Thickness Evaluation for 2nm SiO2 Films, a Comparison of Ellipsometric, Capacitance-Voltage and HRTEM Measurements

Author(s)
James R. Ehrstein, Curt A. Richter, Deane Chandler-Horowitz, Eric M. Vogel, Donnie R. Ricks, Chadwin Young, Steve Spencer, Shweta Shah, Dennis Maher, Brendan C. Foran, Alain C. Diebold, Pui-Yee Hung
We have completed a comparison of SiO2 film thicknesses obtained with the three dominant measurement techniques used in the IC industry . This work is directed...

Critical Dimension Calibration Standards for ULSI Metrology

Author(s)
Richard A. Allen, Michael W. Cresswell, Christine E. Murabito, Ronald G. Dixson, E. Hal Bogardus
NIST and International SEMATECH are developing single-crystal reference materials for use in evaluating and calibrating critical dimension (CD), that is...

Fluorescence Thermometry in Microfluidics

Author(s)
David J. Ross, Laurie E. Locascio
Two techniques are described for the measurement of fluid temperatures in microfluidic systems based on temperature-dependent fluorescence. In the first...
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