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Aaron M. Forster, A Chiche, Martin Chiang, Christopher Stafford, Alamgir Karim
High-throughput and combinatorial methods unlock novel approaches to investigations of new materials, allowing the materials community to carry out studies that...
Marcus T. Cicerone, Joy Dunkers, N. R. Washburn, Forrest A. Landis, James A. Cooper
Tissue scaffold morphological properties are determined and correlated with osteoblast proliferation and ingrowth. Scaffold pore size and connectivity were...
Ravikiran Attota, Richard M. Silver, M R. Bishop, Egon Marx, Jay S. Jun, Michael T. Stocker, M P. Davidson, Robert D. Larrabee
Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip...
A surface magneto-optical trap for chromium atoms is demonstrated as a first step toward loading atoms into microscopic magnetic traps. Characteristics of the...
Rajmohan (. Madhavan, Tsai H. Hong, Elena R. Messina
An iterative temporal registration algorithm is presented in this paper1 for registering 3D range images obtained from unmanned ground and aerial vehicles...
We apply the elastic energy release rate (EERR) to identify the favored location ofquantum dot (QD) formation in the presense of a laterally or vertically...
The fluid dynamics of channel geometries for liquid state materials characterization in microfluidic devices are investigated. A pressure driven microchannel...
A phase-locked fiber laser-based supercontinuum source is presented. The linewidth of a single line of the IR frequency comb produced by fiber laser-based...
John S. Villarrubia, Andras Vladar, B Bunday, M R. Bishop
The widths of 284 lines in a 193 nm resist were measured by two methods and the results compared. One method was scanning electron microscopy (SEM) of cross...
B Bunday, M R. Bishop, D Mccormack, John S. Villarrubia, Andras Vladar, Theodore V. Vorburger, Ndubuisi George Orji, J Allgair
The measurement of line-edge roughness (LER) has recently become a topic of concern in the litho-metrology community and the semiconductor industry as a whole...
The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of...
Xuezeng Zhao, Joseph Fu, Wei Chu, C Nguyen, Theodore V. Vorburger
Nano-scale linewidth measurements are performed in semiconductor manufacturing, the data storage industry, and micro-mechanical engineering. It is well known...
The fluorescence characteristics of an OLED material are demonstrated to be linear with sunlight-like illuminance levels up to several suns. It is therefore...
Afzal A. Godil, Sanford P. Ressler, Patrick J. Grother
In this paper, we investigate the use of 3D surface geometry for face recognition and compare it to one based on color map information. The 3D surface and color...
John S. Suehle, Baozhong Zhu, Yuan Chen, Joseph B. Berstein
Two post soft breakdown modes are studied: one in which the conducting filament is stable until hard breakdown occurs and one in which the filament continually...
Real-time input/output (I/O) communication over Ethernet is still fairly new in the industrial environment. There are many questions about the reliability and...
Joy P. Dunkers, Forrest A. Landis, K Niihara, Hiropshi Jinai
It has been shown that scaffold microstructure impacts cell response.1 Determining the relationship between scaffold structure and cellular response facilitates...
John D. Gillaspy, B Blagojevic, Paul A. Dalgarno, K Fahey, V Kharchenko, J M. Laming, L Logosi, E-O Le Bigot, K Makonyi, L P. Ratliff, E Silver, H. Schnopper, E Takacs, J N. Tan, H Tawara, K Tokesi
After a brief introduction to the NIST EBIT facility, we present the results of three different types of experiments that have been carried out there recently...
Hui-Min Huang, James S. Albus, Elena R. Messina, R C. Wade, W English
The viability of Unmanned Systems as tools is increasingly recognized in many domains. As technology advances, the autonomy on board these systems also advances...
Stephen Knight, John S. Suehle, Joaquin (. Martinez
The National Institute of Standards and Technology provides critical metrology development for the semiconductor manufacturing industry as it moves from the...
Kenneth G. Kreider, D P. DeWitt, J B. Fowler, J E. Proctor, William A. Kimes, Dean C. Ripple, Benjamin K. Tsai
Recent studies on dynamic temperature profiling and lithographic performance modeling of the post-exposure bake (PEB) process have demonstrated that the rate of...
Our results extending Kuhn's fault class hierarchy provide a justification for the focus of fault-based testing strategies on detecting particular faults and...
The emphasis on increasing product variety and individualization has created a strong demand for a new strategy of Mass Customization Manufacturing (MCM). A...
Slides presented at the Innovative Design of Complex Aerospace Systems Workshop at held at the NASA Langley Research Center in Hampton, Virginia, on March 24...
Genetic markers located on the Y chromosome are of increasing importance in human identity testing. In an effort to evaluate the forensic utility of Y...