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Conferences

High-Resolution Optical Overlay Metrology

May 1, 2004

Author(s)

Richard M. Silver, Ravikiran Attota, M R. Bishop, Jay S. Jun, Egon Marx, M P. Davidson, Robert D. Larrabee

Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the...

Flat-Panel-Display Measurement Techniques and Concerns

May 1, 2004

Author(s)

Edward F. Kelley

We explore the problems that can be encountered in making common measurements on flat panel displays. Equipment usage techniques are reviewed and coordinated...

Plotting the Course of the Next VESA Flat Panel Display Measurements Standard

May 1, 2004

Author(s)

Edward F. Kelley

The Display Metrology Committee of the Video Electronics Standards Association is developing the next Flat Panel Display Measurements Standard. The document's...

Conversational Telephone Speech Corpus Collection for the NIST Speaker Recognition Evaluation 2004

May 1, 2004

Author(s)

Alvin F. Martin, D J. Miller, Mark A. Przybocki, Joe Campbell, H Nakasone

This paper discusses some of the factors that should be considered when designing a speech corpus collection to be used for text-independent speaker recognition...

Overview of TREC 2003

May 1, 2004

Author(s)

Ellen M. Voorhees

Mapping Polymeric Properties Using Combinatorial and High-Throughput Methods: Adhesion and Mechanical Properties

May 1, 2004

Author(s)

Aaron M. Forster, A Chiche, Martin Chiang, Christopher Stafford, Alamgir Karim

High-throughput and combinatorial methods unlock novel approaches to investigations of new materials, allowing the materials community to carry out studies that...

Optical Coherence Microscopy for in-situ Monitoring of Cell Growth in Scaffold Constructs

May 1, 2004

Author(s)

Marcus T. Cicerone, Joy Dunkers, N. R. Washburn, Forrest A. Landis, James A. Cooper

Tissue scaffold morphological properties are determined and correlated with osteoblast proliferation and ingrowth. Scaffold pore size and connectivity were...

Evaluation of New In-Chip and Arrayed Line Overlay

May 1, 2004

Author(s)

Ravikiran Attota, Richard M. Silver, M R. Bishop, Egon Marx, Jay S. Jun, Michael T. Stocker, M P. Davidson, Robert D. Larrabee

Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip...

A chromium surface magneto-optical trap for magnetic microtrap studies

May 1, 2004

Author(s)

M Pichler, S Hill, Jabez J. McClelland

A surface magneto-optical trap for chromium atoms is demonstrated as a first step toward loading atoms into microscopic magnetic traps. Characteristics of the...

Temporal Range Registration for Unmanned Ground and Aerial Vehicles

May 1, 2004

Author(s)

Rajmohan (. Madhavan, Tsai H. Hong, Elena R. Messina

An iterative temporal registration algorithm is presented in this paper1 for registering 3D range images obtained from unmanned ground and aerial vehicles...

Effects of Laterally and Vertically Neighboring Quantum Dots on Formation of a New Quantum Dot

May 1, 2004

Author(s)

B. Yang, Vinod Tewary

We apply the elastic energy release rate (EERR) to identify the favored location ofquantum dot (QD) formation in the presense of a laterally or vertically...

Modeling of a Microfluidic Analog of the Four-Roll Mill for Materials Characterization

May 1, 2004

Author(s)

Frederick R. Phelan Jr., Steven Hudson

The fluid dynamics of channel geometries for liquid state materials characterization in microfluidic devices are investigated. A pressure driven microchannel...

Measurement of Complex Impedance at High AC Voltages Using Waveforms

May 1, 2004

Author(s)

Jan Obrzut, K Kano

A Phase Locked, Fiber Laser-Based Frequency Comb: Limit On Optical Linewidth

May 1, 2004

Author(s)

Brian Washburn, Scott Diddams, Nathan R. Newbury

A phase-locked fiber laser-based supercontinuum source is presented. The linewidth of a single line of the IR frequency comb produced by fiber laser-based...

Dimensional Metrology of Resist Lines Using a SEM Model-Based Library Approach

May 1, 2004

Author(s)

John S. Villarrubia, Andras Vladar, B Bunday, M R. Bishop

The widths of 284 lines in a 193 nm resist were measured by two methods and the results compared. One method was scanning electron microscopy (SEM) of cross...

Determination of Optimal Parameters for CD-SEM Measurement of Line Edge Roughness

May 1, 2004

Author(s)

B Bunday, M R. Bishop, D Mccormack, John S. Villarrubia, Andras Vladar, Theodore V. Vorburger, Ndubuisi George Orji, J Allgair

The measurement of line-edge roughness (LER) has recently become a topic of concern in the litho-metrology community and the semiconductor industry as a whole...

Improving the Uncertainty of Photomask Linewidth Measurements

May 1, 2004

Author(s)

J Pedulla, James E. Potzick, Richard M. Silver

The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of...

An Image Stitching Method to Eliminate the Distortion of the Sidewall in Linewidth Measurement

May 1, 2004

Author(s)

Xuezeng Zhao, Joseph Fu, Wei Chu, C Nguyen, Theodore V. Vorburger

Nano-scale linewidth measurements are performed in semiconductor manufacturing, the data storage industry, and micro-mechanical engineering. It is well known...

Scalability of OLED Fluorescence in Consideration of Sunlight-Readability Reflection Measurements

May 1, 2004

Author(s)

Edward F. Kelley, John Penczek

The fluorescence characteristics of an OLED material are demonstrated to be linear with sunlight-like illuminance levels up to several suns. It is therefore...

Face Recognition using 3D Facial Shape and Color Map Information: Comparison and Combination

April 30, 2004

Author(s)

Afzal A. Godil, Sanford P. Ressler, Patrick J. Grother

In this paper, we investigate the use of 3D surface geometry for face recognition and compare it to one based on color map information. The 3D surface and color...

Characterizing the Entangling Capacity of n-qubit Computations

April 30, 2004

Author(s)

Stephen Bullock, G K. Brennen

Finding Small Two-Qubit Circuits

April 30, 2004

Author(s)

V V. Shende, I L. Markov, Stephen Bullock

Acceleration Factors and Mechanistic Study of Progressive Breakdown in Small Area Ultra-thin Gate Oxides

April 29, 2004

Author(s)

John S. Suehle, Baozhong Zhu, Yuan Chen, Joseph B. Berstein

Two post soft breakdown modes are studied: one in which the conducting filament is stable until hard breakdown occurs and one in which the filament continually...

Real-Time I/O Performance Metrics and Tests for Industrial Ethernet

April 28, 2004

Author(s)

James D. Gilsinn

Real-time input/output (I/O) communication over Ethernet is still fairly new in the industrial environment. There are many questions about the reliability and...

3d, Quantitative Image Analysis Of Poly(ε-caprolactone) Scaffolds With Bicontinuous Morphology

April 27, 2004

Author(s)

Joy P. Dunkers, Forrest A. Landis, K Niihara, Hiropshi Jinai

It has been shown that scaffold microstructure impacts cell response.1 Determining the relationship between scaffold structure and cellular response facilitates...

Visible, EUV, and X-Ray Spectroscopy at the NIST EBIT Facility

April 24, 2004

Author(s)

John D. Gillaspy, B Blagojevic, Paul A. Dalgarno, K Fahey, V Kharchenko, J M. Laming, L Logosi, E-O Le Bigot, K Makonyi, L P. Ratliff, E Silver, H. Schnopper, E Takacs, J N. Tan, H Tawara, K Tokesi

After a brief introduction to the NIST EBIT facility, we present the results of three different types of experiments that have been carried out there recently...

Specifying Autonomy Levels for Unmanned Systems: Interim Report

April 16, 2004

Author(s)

Hui-Min Huang, James S. Albus, Elena R. Messina, R C. Wade, W English

The viability of Unmanned Systems as tools is increasingly recognized in many domains. As technology advances, the autonomy on board these systems also advances...

Reliability Metrology for the Semiconductor Industry at NIST

April 10, 2004

Author(s)

Stephen Knight, John S. Suehle, Joaquin (. Martinez

The National Institute of Standards and Technology provides critical metrology development for the semiconductor manufacturing industry as it moves from the...

Infrared Spectral Emissivity Characterization Facility at NIST

April 1, 2004

Author(s)

Leonard M. Hanssen, Sergey Mekhontsev, V B. Khromchenko

Comparing the Transient Response of a Resistive-Type Sensor With a Thin Film Thermocouple During the Post-Exposure Bake Process

April 1, 2004

Author(s)

Kenneth G. Kreider, D P. DeWitt, J B. Fowler, J E. Proctor, William A. Kimes, Dean C. Ripple, Benjamin K. Tsai

Recent studies on dynamic temperature profiling and lithographic performance modeling of the post-exposure bake (PEB) process have demonstrated that the rate of...

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