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Conferences

Absolute frequency measurements with a stabilized near-infrared optical frequency comb from a Cr:forsterite laser

Author(s)
Kristan L. Corwin, I Thomann, Tasshi Dennis, R W. Fox, William C. Swann, E. A. Curtis, C. W. Oates, G Wilpers, A Bartels, Sarah L. Gilbert, Leo W. Hollberg, Scott Diddams, Nathan R. Newbury, Jeffrey W. Nicholson, M. Yan
A Cr:forsterite laser-based frequency comb is stabilized simultaneously to two NIST frequency references. Methane lines from 1315 nm - 1330 nm are measured with

IPPS: An Integrated Process Planning System

Author(s)
Suber Huang, J Mei, Xuhang Tong, Steven R. Ray
The past two decades have witnessed the development of many CAPP (Computer-Aided Process Planning) systems. From variant process planning to generative process

High-Resolution Optical Overlay Metrology

Author(s)
Richard M. Silver, Ravikiran Attota, M R. Bishop, Jay S. Jun, Egon Marx, M P. Davidson, Robert D. Larrabee
Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the

Evaluation of New In-Chip and Arrayed Line Overlay

Author(s)
Ravikiran Attota, Richard M. Silver, M R. Bishop, Egon Marx, Jay S. Jun, Michael T. Stocker, M P. Davidson, Robert D. Larrabee
Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip
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