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Wonpil Yu, J A. Bain, Willard C. Uhlig, John Unguris
The usage of high moment FeCo alloys in magnetic recording heads can result in stress induced anisotropy due to the high magnetostriction constants of FeCo
In this position paper, we briefly describe the perspective of the US National Center for Ontological Research (NCOR, http://ncor.us) on ontology evaluation
The next generation of Product Data Exchange (PDE) standards will require the active participation of domain experts in the standards development process. Due
Christoph J. Witzgall, Geraldine Cheok, Anthony J. Kearsley
The National Institute of Standards and Technology is involved in developing standard protocols for the performance evaluation of 3D imaging systems, which
The printed circuit board (PCB) industry has been using the Gerber (RS-274) file format for decades, resulting in a substantial library of legacy designs. One
The international standard ISO 10303 (STEP) is being extended to permit the exchange of procedurally defined shape models, with additional parameterization and
Till P. Rosenband, Wayne M. Itano, Piet Schmidt, David Hume, Jeroen Koelemeij, James C. Bergquist, David J. Wineland
The differential polarizability, due to near-infrared light at 1126 nm, of the 27Al + 1S 0 – 3P 0 transition is measured to be {Δ}α = (1.6 ± x 10 -31 m 3, where
Vladislav Gerginov, V Shah, Svenja A. Knappe, Leo W. Hollberg, John E. Kitching
Progress towards simplification and improvement of the long-term stability of chip-scale atomic clocks is presented. The conventional technique of laser optical
Christopher W. Oates, Yann LeCoq, G Wilpers, Leo W. Hollberg
We report new measurements and modifications for a simple, compact, Ca atomic clock at 657 nm. External measurements were made against an independent Yb lattice
Filippo Levi, Jon H. Shirley, Thomas P. Heavner, Dai Yu, Steven R. Jefferts
In this paper we analyze the behavior of the frequency shift caused by spurious spectral component in the microwave spectrum against variation of the excitation
C Hoyt, Zeb Barber, Christopher W. Oates, A. V. Taichenachev, V. I. Yudin, Leo W. Hollberg
We report spectroscopy of the 1S 0 - 3P 0 clock transition in neutral 174Yb atoms confined to a one- dimensional optical lattice at the ac Stark shift-canceling
Ravikiran Attota, Richard M. Silver, M R. Bishop, Ronald G. Dixson
In this paper we present utility of the out of focus optical microscope images for metrology applications as opposed to the best focus images. Depending on the
R Katz, C D. Chase, R Kris, R Peltinov, John S. Villarrubia, B Bunday
The importance of Critical Dimension (CD) roughness metrics such as Line and Contact edge roughness (LER, CER) and their associated width metrics (LWR, CWR)
Leonard E. Miller, Perry F. Wilson, Nelson P. Bryner, Michael H. Francis, Jeffrey R. Guerrieri, D W. Stroup, Luke Klein-Berndt
An indoor localization and communication project is described that proposes to use RFID tags, placed in the building beforehand, as navigation waypoints for an
The Advanced Measurement Laboratory at NIST in Gaithersburg has already provided real, measurable improvement in some dimensional metrology measurement
A direct comparison power measurement system has been developed to measure power sensor effective efficiency in the 100 kHz to 18 GHz frequency range. This
Who needs time and frequency? This paper answers that question by discussing the technologies and applications that rely on precise time and frequency, and
Jean C. Scholtz, Mary F. Theofanos, Brian Antonishek
This paper discusses the development of a test bed to evaluate the combined performance of the human operator and an explosive ordnance disposal robot. We have
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Michael W. Cresswell, Richard A. Allen, William F. Guthrie
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. There are two major
Martin Y. Sohn, Bryan M. Barnes, Lowell P. Howard, Richard M. Silver, Ravikiran Attota, Michael T. Stocker
Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the
Richard M. Silver, Bryan M. Barnes, Ravikiran Attota, Jay S. Jun, James J. Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J. Patrick, Ronald G. Dixson, Robert D. Larrabee
An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this
Ndubuisi G. Orji, Angela Martinez, Ronald G. Dixson, J Allgair
The National Institute of Standards and Technology (NIST) and SEMATECH are working to address traceability issues in semiconductor dimensional metrology. In