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Conferences

Koehler Illumination for High-Resolution Optical Metrology

Author(s)
Martin Y. Sohn, Bryan M. Barnes, Lowell P. Howard, Richard M. Silver, Ravikiran Attota, Michael T. Stocker
Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the

The Limits of Image-Based Optical Metrology

Author(s)
Richard M. Silver, Bryan M. Barnes, Ravikiran Attota, Jay S. Jun, James J. Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J. Patrick, Ronald G. Dixson, Robert D. Larrabee
An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this

Traceable Atomic Force Microscope Dimensional Metrology at NIST

Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Michael W. Cresswell, Richard A. Allen, William F. Guthrie
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. There are two major

Fundamentals of the Reaction-Diffusion Process in Model EUV Photoresists

Author(s)
Kristopher Lavery, George Thompson, Hai Deng, D S. Fryer, Kwang-Woo Choi, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, Michael Leeson, Heidi B. Cao
More demanding requirements are being made of photoresist materials for fabrication of nanostructures as the feature critical dimensions (CD) decrease. For EUV

The Next Generation of Laser Radiometry at NIST

Author(s)
John H. Lehman, Christopher L. Cromer, Marla L. Dowell
High accuracy laser radiometry is on the verge of significant improvements just as new laser technologies are evolving. Our present tasks are directed toward

Cross-Display-Technology Video Motion Measurement Tools

Author(s)
John W. Roberts, Edward A. Fanning, Hassan A. Sahibzada
High performance video places severe demands on playback system and display device resources. Motion playback errors such as irregular motion playback and image

Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists

Author(s)
Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Karen Turnquest, W D. Hinsberg
The dissolution of partially deprotected chemically amplified photoresists is the final step in printing lithographic features. Since this process step can be

Terahertz circular variable filters

Author(s)
Erich N. Grossman, Charles Dietlein, A. Luukanen
We describe a novel class of millimeter-wave and terahertz monochrometers based on adiabatically tuned frequency-selective surfaces. They are analogous to the

Phenomenology of Passive Broadband Terahertz Images

Author(s)
Charles Dietlein, A. Luukanen, Francois Meyer, Zoya Popovic, Erich N. Grossman
Images acquired by a 105-mK noise equivalent temperature difference (NETD) scanned single-pixel broadband 0.1-1 THz passive system are analyzed with two

Development of a Color Quality Scale

Author(s)
Wendy L. Davis, Yoshihiro Ohno
A new metric for evaluating the color quality of light sources is being developed at NIST, in close contact with the lighting industry and the CIE. The current
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