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Conferences

Electromagnetic Emissions and Performance for Proximity RFID

Author(s)
Jeffrey R. Guerrieri, David R. Novotny, Michael H. Francis, Catherine A. Remley
We examined the electromagnetic emissions, and performance of commercial High-Frequency (HF) proximity Radio Frequency Identification (RFID) systems including...

NUMERICAL SIMULATION OF FIRE SPREAD ON POLYURETHANE FOAM SLABS

Author(s)
Kuldeep R. Prasad, Roland Kramer, Nathan D. Marsh, Marc R. Nyden, Thomas J. Ohlemiller, William M. Pitts, Mauro Zammarano
The NIST Fire Dynamics Simulator (FDS) is used extensively by the fire protection engineer for performance based design and forensic analysis. The equations of...

FIREBRAND ATTACK ON CERAMIC TILE ROOFING ASSEMBLIES

Author(s)
Samuel L. Manzello, Yoshihiko Hayashi, Takefumi Yoneki, Yu Yamamoto
The present study is concerned with investigating the ignition of ceramic roofing assembles (Spanish tile roofing) to a controlled firebrand attack using the...

SUSTAINABLE FLAME RETARDANT NANOCOMPOSITES

Author(s)
Jeffrey W. Gilman
This paper examines the current state of research into sustainable flame retardants with the work on nanocomposites highlighted. The motivations to move away...

CMOS Microhotplate Technology for Chemical and Biological Agent Detection

Author(s)
Muhammad Y. Afridi, Christopher B. Montgomery, Elliott cooper-Balis, Stephen Semancik, Jon C. Geist, Alim A. Fatah
In this paper we describe microhotplates that can serve as platforms for gas sensors of potential use for homeland security and other gas sensing applications...

Pulse shaping for background free broadband CARS

Author(s)
Young Jong Lee, Marcus T. Cicerone
We demonstrate that pulse shaping of a probe pulse can suppress the nonresonant background (NRB) contribution and retrieve resonant Raman signal efficiently in...

EUVL dosimetry at NIST

Author(s)
Charles S. Tarrio, Steven E. Grantham, Marc J. Cangemi, Robert E. Vest, Thomas B. Lucatorto, Noreen Harned
As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts...

Characterization of the Photoacid Diffusion Length

Author(s)
Shuhui Kang, Vivek Prabhu, Wen-Li Wu, Eric K. Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh
The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness...
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