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Conferences

HF RFID Electromagnetic Emissions and Performance

Author(s)
David R. Novotny, Jeffrey R. Guerrieri, Michael H. Francis, Catherine A. Remley
We examined the emissions, and susceptibility of commercial High-Frequency Radio Frequency Identification (HF proximity RFID) systems to interrupt and

NIST BusiBEES METRICS AND TOOLS FOR GREEN BUILDINGS

Author(s)
Barbara C. Lippiatt, Jennifer Helgeson
Building stakeholders need compelling metrics, tools, data, and case studies supporting major investments in sustainable building technologies. Proponents of

UV pulse response nonlinearity of two Si photodiodes

Author(s)
Shao Yang, Darryl A. Keenan, Marla L. Dowell
We measured the pulse response nonlinearity of two silicon photodiodes at 193 and 248 nm with different measurement conditions. We found large and different

A microfabricated photonic magnetometer

Author(s)
Jan Preusser, Vladislav Gerginov, Svenja A. Knappe, John E. Kitching
An integrated optically-controlled sensor, suitable for remote, high-sensitivity detection of magnetic fields is presented. The sensor head is free of

Establishment of the SIM Time Scale

Author(s)
Michael A. Lombardi, Nelida Diaz-Munoz, J. Mauricio Lopez-Romero
The SIM time and frequency metrology working group has developed a comparison network for the Americas, with the goals of improving metrology in the SIM region

Error Motions of a Non-orthogonal Rotary Axis

Author(s)
Michael L. McGlauflin, Shawn P. Moylan
Error-motions of rotating axes are one of many sources of imprecision in machining. Accurate determination of axis of rotation error motions of the rotary axes

Comparison of NIST SI Force Scale to NPL SI Mass Scale

Author(s)
Christopher W. Jones, John A. Kramar, Stuart Davidson, Richard Leach, Jon R. Pratt
Small masses in the 1.0 mg to 0.1 mg range were developed and calibrated at NPL with traceability to the IPK. These masses were transported to NIST at

International photomask linewidth comparison by NIST and PTB

Author(s)
James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase
In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral

The transient behavior of NBTI - A new prospective

Author(s)
Kin P. Cheung, Jason P. Campbell
The Negative-Bias-Temperature-Instability (NBTI) is currently one of the most serious reliability issues in advanced CMOS technology. Specifically, the fast

The Origins of Random Telegraph Noise in Highly Scaled SiON nMOSFETs

Author(s)
Jason P. Campbell, Jin Qin, Kin P. Cheung, Liangchun (. Yu, John S. Suehle, A Oates, Kuang Sheng
Random telegraph noise (RTN) has recently become an important issue in advanced circuit performance. It has also recently been used as a tool for gate
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