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International photomask linewidth comparison by NIST and PTB

Published

Author(s)

James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase

Abstract

In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution describes the rationale of both comparisons, the design of the mask comparison standards to be used and the measurement methods applied for traceable linewidth metrology at NIST and PTB.
Proceedings Title
Proceedings SPIE Photomask 2008 (BACUS)
Conference Dates
October 6-10, 2008
Conference Location
Monterey, CA

Keywords

linewidth, CD metrology, uncertainty components, Nano1, international comparison, MRA

Citation

Potzick, J. , Dixson, R. , Quintanilha, R. , Stocker, M. , Vladar, A. , Buhr, E. , Bodermann, B. , Hassler-Grohne, W. , Bosse, H. and Frase, C. (2008), International photomask linewidth comparison by NIST and PTB, Proceedings SPIE Photomask 2008 (BACUS), Monterey, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=824713 (Accessed December 3, 2021)
Created October 17, 2008, Updated February 19, 2017