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Advanced Metrology for Nanoelectronics at the National Institute of Standards and Technology

Published

Author(s)

Joaquin (. Martinez, Yaw S. Obeng, Stephen Knight

Abstract

A broad range of programs at the National Institute of Standards and Technology address critical metrology and characterization challenges facing the nanoelectronics industry. A brief history of the program will be included. From these programs we will describe some exemplary projects developing new measurement and characterization techniques for nanodevices. These will include, among others, the use of helium ion microscope, spin-transfer microwave nano-oscillators, characterization of graphene, advanced atomic force microscope, and development of a microcalorimeter-based high resolution X-ray analyzer.
Conference Dates
March 11-13, 2009
Conference Location
Shanghai, CH
Conference Title
FDP (Flat Panel Display) China 2009

Keywords

metrology, nanotechnology, graffene, spintronics, carbon nanotubes

Citation

Martinez, J. , Obeng, Y. and Knight, S. (2009), Advanced Metrology for Nanoelectronics at the National Institute of Standards and Technology, FDP (Flat Panel Display) China 2009, Shanghai, CH, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=901409 (Accessed April 19, 2024)
Created March 11, 2009, Updated February 19, 2017