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Conferences

A 350-GHz high-resolution high-sensitivity passive video imaging system

Author(s)
Daniel T. Becker, James A. Beall, Hsiao-Mei Cho, William Duncan, Kent D. Irwin, Gene C. Hilton, Robert D. Horansky, Peter J. Lowell, Michael D. Niemack, Nicholas G. Paulter Jr., Carl D. Reintsema, Francis J. Schima, Robert E. Schwall, Ki W. Yoon, Peter Ade, Carole Tucker, Simon Dicker, Mark Halpern
We are developing a 350 GHz cryogenic passive video imaging system. This demonstration system uses 800 photon-noise-limited superconducting transition edge

Privacy-Preserving DRM

Author(s)
Radia Perlman, Charles Kaufman, Ray Perlner
This paper describes and contrasts two families of schemes that enable a user to purchase digital content without revealing to anyone what item he has purchased

Significance Test in Operational ROC Analysis

Author(s)
Jin Chu Wu, Alvin F. Martin, Raghu N. Kacker, Robert C. Hagwood
To evaluate the performance of fingerprint-image matching algorithms on large datasets, a receiver operating characteristic (ROC) curve is applied. From the

The Limits and Extensibility of Optical Patterned Defect Inspection

Author(s)
Richard M. Silver, Bryan M. Barnes, Martin Y. Sohn, Richard Quintanilha, Hui Zhou, Chris Deeb, Mark Johnson, Milton Goodwin, Dilip Patel
New techniques recently developed at the National Institute of Standards and Technology using bright field optical tools are applied to signal-based defect

Multiwalled carbon nanotubes coated with silicon carbonitride (SiCN)

Author(s)
Katie Hurst, Christopher L. Cromer, Elisabeth Mansfield, Roop Mahajan, John H. Lehman, Gurpreet Singh
We describe the development of two next-generation optical coatings; amorphous polymer-derived silicon carbonitride (SiCN) particles and a composite consisting

Calibration of 1 nm SiC Step Height Standards

Author(s)
Theodore V. Vorburger, Albert M. Hilton, Ronald G. Dixson, Ndubuisi G. Orji, J. A. Powell, A. J. Trunek, P. G. Neudeck, P. B. Abel
We aim to develop and calibrate a set of step height standards to meet the range of steps useful for nanotechnology. Of particular interest to this community is

Proximity-associated errors in contour metrology

Author(s)
John S. Villarrubia, Ronald G. Dixson, Andras Vladar
In contour metrology the CD-SEM (critical dimension scanning electron microscope) assigns a continuous boundary to extended features in an image. The boundary
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