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Search Publications by: Eric K. Lin (Fed)

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Displaying 226 - 250 of 392

X-Ray and Neutron Porosimetry as Powerful Methodologies for Determining Structural Characteristics of Porous Low-k Thin Films

June 1, 2004
Author(s)
Hae-Jeong Lee, B D. Vogt, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Wen-Li Wu, Eric K. Lin, Gwi-Gwon Kang, Min-Jin Ko
Methylsilsesquioxane based porous low-k dielectric films with varying porogen loading have been characterized using X-ray and neutron porosimetry to determine their pore size distribution, average density, wall density, porosity, density profiles, and

Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists

May 1, 2004
Author(s)
Vivek M. Prabhu, M Wang, E Jablonski, B D. Vogt, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos, H Ito
Organic polar solvent (1-butanol) versus aqueous base (tetramethylammonium hydroxide, (TMAH)) development quality are distinguished by neutral versus charged polymer (polyelectrolyte) dissolution behavior of photoresist bilayers on silicon substrates

Surface Effects in Chemically Amplified Photoresists: Environmental Stability and Segregation

February 1, 2004
Author(s)
E Jablonski, Vivek M. Prabhu, S Sambasivan, Daniel A. Fischer, Eric K. Lin, D L. Goldfarb, M Angelopoulos, H Ito
It is well known that chemically amplified photoresists are sensitive to certain airborne molecular contaminants, notably amines, during post exposure delay, although the actual cause and specific failure mechanism are unknown. To assess the effect of low

Water Absorption in Thin Photoresist Films

February 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin
In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a

Near Edge X-Ray Absorption Fine Structure Measurements of the Interface Between Bottom Anti-Reflective Coatings and a Model Deprotected Photoresist

December 1, 2003
Author(s)
E Jablonski, S Sambasivan, Daniel A. Fischer, Eric K. Lin, C Devadoss, R Puligadda
The interface between bottom anti-reflective coatings (BARCs) and a model deprotected photoresist, poly(4-hydroxystyrene) (PHS), was investigated using near edge x-ray absorption fine structure spectroscopy to identify mechanisms responsible for pattern

Small Angle X-Ray Scattering for Sub-100 nm Pattern Characterization

November 1, 2003
Author(s)
Ronald L. Jones, T Hu, Eric K. Lin, Wen-Li Wu, R Kolb, D Casa, P J. Bolton, G G. Barclay
The characterization of sub-100 nm photolithographic patterns with nanometer scale resolution is demonstrated using Small Angle X-ray Scattering (SAXS). The transmission scattering geometry employed is capable of high throughput measurements with

Interdiffision in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 10, 2003
Author(s)
Chengqing C. Wang, Vivek M. Prabhu, Christopher L. Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared