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Near Edge X-Ray Absorption Fine Structure Measurements of the Interface Between Bottom Anti-Reflective Coatings and a Model Deprotected Photoresist

Published

Author(s)

E Jablonski, S Sambasivan, Daniel A. Fischer, Eric K. Lin, C Devadoss, R Puligadda

Abstract

The interface between bottom anti-reflective coatings (BARCs) and a model deprotected photoresist, poly(4-hydroxystyrene) (PHS), was investigated using near edge x-ray absorption fine structure spectroscopy to identify mechanisms responsible for pattern degradation at the BARC/photoresist interface. Interactions at this interface can lead to pattern deviations such as footing, undercut, and pattern collapse. It was found that a residual layer is only formed when the bilayer is subject to UV exposure. The spectra of the BARC surfaces after photoresist processing and development show a combination of spectral features from both PHS and the BARC formulations. The data suggest that the residual layer results from interactions between crosslinker and photoresist that occur during normal photoresist processing.
Citation
Journal of Vacuum Science and Technology B
Volume
21
Issue
No. 6

Keywords

157 nm photoresists, lithography, NEXAFS, polymer blend, surface segregation, thin film

Citation

Jablonski, E. , Sambasivan, S. , Fischer, D. , Lin, E. , Devadoss, C. and Puligadda, R. (2003), Near Edge X-Ray Absorption Fine Structure Measurements of the Interface Between Bottom Anti-Reflective Coatings and a Model Deprotected Photoresist, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852222 (Accessed April 19, 2024)
Created December 1, 2003, Updated February 17, 2017