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Vivek M. Prabhu, Shuhui Kang, David L. VanderHart, Eric K. Lin, Wen-Li Wu
Photoresist materials enable the fabrication of advanced integrated circuits with ever decreasing feature sizes. As next-generation light sources are developed
Shuhui Kang, Vivek M. Prabhu, Christopher L. Soles, Eric K. Lin, Wen-Li Wu
A new methodology to quantify the sensitivity and resolution of infrared variable angle spectroscopic ellipsometry (IRSE) measurements was developed for probing
Deuk Y. Lee, Daniel R. Hines, Christopher M. Stafford, Christopher L. Soles, Eric K. Lin, Gottlieb Oehrlein
we performed a survey of the factors controlling the changes of the adhesion characteristics for PMMA and PET surfaces upon plasma activation of the respective
Dean M. DeLongchamp, Regis J. Kline, Youngsuk Jung, David Germack, Eric K. Lin, Andrew Moad, Lee J. Richter, Michael F. Toney, Martin Heeney, Iain McCulloch
Terraced nanoscale ribbon domains of a poly(2,5-bis(3-alkylthiophen-2-yl) thieno[3,2-b]thiophene) form after thin films are cooled from its highest-temperature
Chengqing C. Wang, Wei-En Fu, Bin Li, Huai Huang, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, Paul S. Ho, Michael W. Cresswell
Small angle X-ray scattering (SAXS) was used to characterize the line cross section of nanoline gratings fabricated using electron beam lithography (EBL)
Shuhui Kang, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh
The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness
Dean M. DeLongchamp, Regis J. Kline, Youngsuk Jung, Eric K. Lin, Daniel A. Fischer, David J. Gundlach, Andrew Moad, Lee J. Richter, Michael F. Toney, Martin Heeney, Iain McCulloch
The carrier mobility of poly(2,5-bis(3-alkylthiophen-2-yl) thieno[3,2-b]thiophene) semiconductors can be substantially enhanced after heating through a
Vijay Tirumala, August W. Bosse, Eric K. Lin, Vikram Daga, Alvin Romang, Jan Ilavsky, J J. Watkins
The use of short chain block copolymer melts as nanostructured templates for sub-10 nm domains is often limited by their low segregation strength (N). Since
Vivek M. Prabhu, Ashwin Rao, Shuhui Kang, Eric K. Lin, Sushil K. Satija
The depth profile of swelling polyelectrolyte layers is characterized by a static substrate layer and an asymmetric profile with position and shape parameters
Vijay Tirumala, Sanghun Lee, Taiki Tominaga, Eric K. Lin, Jian P. Gong, Paul D. Butler, Wen-Li Wu
A molecular mechanism is proposed for the toughness enhancement observed in double network (DN) hydrogels prepared from poly (2 acrylamido, 2-methyl, 1
Youngsuk Jung, Regis J. Kline, Eric K. Lin, Daniel A. Fischer, Michael F. Toney, Martin Heeney, Iain McCulloch, Dean M. DeLongchamp
The performance of organic field-effect transistors (OFETs) significantly depends on the properties of the interface between the semiconductor and gate
Hyun Wook Ro, H Peng, Ken-ich Nihara, Hae-Jeong Lee, Eric K. Lin, Alamgir Karim, D Gidley, Hiropshi Jinai, Do Y. Yoon, Christopher L. Soles
In this letter we describe how highly porous nanostructures can be directly printed into a poly(methylsilsequioxane) (PMSQ)-based organosilicate film, with high
Vijay Tirumala, Alvin Romang, Sumit Agarwal, Eric K. Lin, J J. Watkins
Here, we report that well ordered, processible polymer melts with periodic nanostructures can be obtained in bulk quantity by simple blending of commercially
Hae-Jeong Lee, Christopher L. Soles, Hyun Wook Ro, Shuhui Kang, Eric K. Lin, Alamgir Karim, Wen-Li Wu
Specular X-ray reflectivity (SXR) can be used, in the limit of the effective medium approximation (EMA), as a high-resolution shape metrology for periodic
Hyun Wook Ro, Hae-Jeong Lee, Eric K. Lin, Alamgir Karim, Daniel R. Hines, Do Y. Yoon, Christopher L. Soles
Directly patterning dielectric insulator materials for semiconductor devices via nanoimprint lithography has the potential to simplify fabrication processes and
Chengqing C. Wang, Ronald L. Jones, Kwang-Woo Choi, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, James S. Clarke, John S. Villarrubia, Benjamin Bunday
Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall
Y S. Jung, Regis J. Kline, Daniel A. Fischer, Eric K. Lin, Martin Heeney, Iain McCulloch, Dean M. DeLongchamp
We control and vary the roughness of a dielectric upon which a high-performance polymer semiconductor, poly(2,5-bis(3-alkylthiophen-2-yl)thieno[3,2-b]thiophene)
Taiki Tominaga, Vijay Tirumala, Sanghun Lee, Eric K. Lin, Jian P. Gong, Wen-Li Wu
Double-network hydrogels (DN-gels) prepared from the combination of a moderately crosslinked anionic polyelectrolyte and an uncrosslinked linear polymer
Deuk Y. Lee, Gottlieb Oehrlein, Daniel R. Hines, Jiong Liu, Jun Y. Chung, Christopher M. Stafford, Christopher L. Soles, Eric K. Lin
Nanotransfer printing (NTP) has attracted much attention as a method for fabricating nanoscale structures using materials that are not generally compatible with
Kristopher Lavery, Vivek M. Prabhu, Eric K. Lin, Wen-Li Wu, Kwang-Woo Choi, Sushil K. Satija, M Wormington
Off-specular reflectivity, or diffuse scattering, probes the lateral compositional variations at surfaces and interfaces. Of particular interest is the
Kristopher Lavery, Vivek M. Prabhu, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, Kwang-Woo Choi, M Wormington
A combination of specular and off-specular neutron reflectometry was used to measure the buried lateral roughness of the reaction-diffusion front in a model