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Search Publications by: Eric K. Lin (Fed)

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Displaying 1 - 25 of 196

Additive-Containing Rinses for LER and Defectivity Control During High-Resolution Resist Patterning

October 12, 2021
Author(s)
D L. Goldfarb, S D. Burns, M Angelopolous, S Skordas, R L. Burns, M C. Lawson, C J. Brodsky, V Vishnu, E Jablonski, Vivek Prabhu, Ronald L. Jones, B D. Vogt, Christopher Soles, Eric K. Lin, Wen-Li Wu
The addition of a surface conditioning agent to the de-ionized water rinse used to quench the photoresist development process is an attractive methodology that can afford a controlled decrease in resist line edge roughness (LER) or a reduction in

Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography

October 12, 2021
Author(s)
D M. Goldfarb, Eric K. Lin, Christopher Soles, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Wilson, Sushil K. Satija, Wen-Li Wu
State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high spatial resolution, enabling the fabrication of continually decreasing feature sizes in the

Functional Oligothiophenes for Use in Self-Assembled Monolayer Field-Effect Transistors

October 12, 2021
Author(s)
A R. Murphy, Clayton Mauldin, J M. Frechet, Paul C. Chang, Kanan Putambekar, Kin-Yip Phoa, V Subramanian, Dean DeLongchamp, Daniel A. Fischer, Eric K. Lin
Asymmetric, end-functionalized thiophene oligomers capable of self-assembly and covalent bonding to silicon surfaces have been synthesized. Monolayer films were made using solution or Langmuir-Blodgett deposition techniques. Characterization of the films

Understanding Deviations in Lithographic Patterns Near Interfaces: Characterization of Antireflective Coatings (ARC) and the ARC/Resist Interface

October 12, 2021
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Wen-Li Wu, Douglas Guerrero, Yijun Wang, R Puligadda
Interactions between a bottom anti-reflective coating (BARC) and a photo-resist can critically impact lithographic patterns. For example, a lithographic pattern can shrink or spread near a BARC interface, a process called undercutting or footing

Photoresist latent and developer images as probed by neutron reflectivity methods

September 16, 2010
Author(s)
Vivek M. Prabhu, Shuhui Kang, David L. VanderHart, Eric K. Lin, Wen-Li Wu
Photoresist materials enable the fabrication of advanced integrated circuits with ever decreasing feature sizes. As next-generation light sources are developed, using extreme ultraviolet light of wavelength 13.5 nm, these highly-tuned formulations must

Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends

August 25, 2009
Author(s)
David L. VanderHart, Vivek Prabhu, Kristopher Lavery, Cindi L. Dennis, Ashwin Rao, Eric K. Lin
We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this work

Low-temperature plasma assisted nanotransfer printing between thermoplastic polymers

March 26, 2009
Author(s)
Deuk Y. Lee, Daniel R. Hines, Christopher Stafford, Christopher Soles, Eric K. Lin, Gottlieb Oehrlein
we performed a survey of the factors controlling the changes of the adhesion characteristics for PMMA and PET surfaces upon plasma activation of the respective interfaces for nanotransfer printing. Polar active functional groups introduced by plasma

Controlling the Formation and Orientation of Terraced Nanoscale Ribbons of a Thiophene-Based Copolymer

March 24, 2009
Author(s)
Dean M. DeLongchamp, Regis J. Kline, Youngsuk Jung, David Germack, Eric K. Lin, Andrew Moad, Lee J. Richter, Michael F. Toney, Martin Heeney, Iain McCulloch
Terraced nanoscale ribbon domains of a poly(2,5-bis(3-alkylthiophen-2-yl) thieno[3,2-b]thiophene) form after thin films are cooled from its highest-temperature phase. A simple flow coating procedure can induce high levels of ribbon orientation and even

Small Angle X-Ray Scattering Measurements of Spatial Dependent Linewidth in Dense Nanoline Gratings

March 16, 2009
Author(s)
Chengqing C. Wang, Wei-En Fu, Bin Li, Huai Huang, Christopher Soles, Eric K. Lin, Wen-Li Wu, Paul S. Ho, Michael W. Cresswell
Small angle X-ray scattering (SAXS) was used to characterize the line cross section of nanoline gratings fabricated using electron beam lithography (EBL) patterning followed by anisotropic wet etching into silicon single crystal. SAXS results at normal

Characterization of the Photoacid Diffusion Length

February 27, 2009
Author(s)
Shuhui Kang, Vivek Prabhu, Wen-Li Wu, Eric K. Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh
The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness (LER) and line-width-roughness (LWR). This paper provides an approach to characterize the photoacid

The molecular basis of mesophase ordering in a thiophene-based copolymer

February 18, 2009
Author(s)
Dean M. DeLongchamp, Regis J. Kline, Youngsuk Jung, Eric K. Lin, Daniel A. Fischer, David J. Gundlach, Andrew Moad, Lee J. Richter, Michael F. Toney, Martin Heeney, Iain McCulloch
The carrier mobility of poly(2,5-bis(3-alkylthiophen-2-yl) thieno[3,2-b]thiophene) semiconductors can be substantially enhanced after heating through a thermotropic mesophase transition, which causes a significant improvement in thin film structural order

Investigation of N 2 Plasma Effects on the Depth Profile of Hydrogen Silsesquioxane Thin Films Using High Resolution Specular X-Ray Reflectivity

October 16, 2008
Author(s)
Hae-Jeong Lee, Eric K. Lin, J K. Lan, Y L. Cheng, H C. Liou, Wen-Li Wu, Y L. Wang, M S. Feng, C G. Chao
Non-destructive, specular X-ray reflectivity (SXR) measurements were used to investigate N2 plasma effects on the density depth profile of hydrogen silsesquioxane (HSQ) thin films. The SXR data indicate that the density profile of an HSQ film without

Neutron Reflectivity for Interfacial Materials Characterization

October 16, 2008
Author(s)
Eric K. Lin, D J. Pochan, R Kolb, Wen-Li Wu, Sushil K. Satija
Measurements of the physical properties of materials, such as the coefficient of thermal expansion (CTE), in thin films and at interfaces are very important in microelectronics packaging and interconnection, especially as electronic devices decrease in

Well-Ordered Polymer Melts with 5 nm Lamellar Domains from Blends of a Disordered Block Copolymer and a Selectively Associating Homopolymer of Low or High Molar Mass

October 16, 2008
Author(s)
Vijay Tirumala, August W. Bosse, Eric K. Lin, Vikram Daga, Alvin Romang, Jan Ilavsky, J J. Watkins
The use of short chain block copolymer melts as nanostructured templates for sub-10 nm domains is often limited by their low segregation strength (N). Since increasing molar mass to strengthen segregation also increases the interdomain spacing of block
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